JPS6085522A - 半導体ウエハの被覆剤塗布装置 - Google Patents

半導体ウエハの被覆剤塗布装置

Info

Publication number
JPS6085522A
JPS6085522A JP19454383A JP19454383A JPS6085522A JP S6085522 A JPS6085522 A JP S6085522A JP 19454383 A JP19454383 A JP 19454383A JP 19454383 A JP19454383 A JP 19454383A JP S6085522 A JPS6085522 A JP S6085522A
Authority
JP
Japan
Prior art keywords
semiconductor wafer
resist
coating material
covering material
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19454383A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6233738B2 (enrdf_load_stackoverflow
Inventor
Haruhiko Oku
奥　治彦
Haruo Tanaka
田中　治夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP19454383A priority Critical patent/JPS6085522A/ja
Publication of JPS6085522A publication Critical patent/JPS6085522A/ja
Publication of JPS6233738B2 publication Critical patent/JPS6233738B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Coating Apparatus (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP19454383A 1983-10-17 1983-10-17 半導体ウエハの被覆剤塗布装置 Granted JPS6085522A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19454383A JPS6085522A (ja) 1983-10-17 1983-10-17 半導体ウエハの被覆剤塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19454383A JPS6085522A (ja) 1983-10-17 1983-10-17 半導体ウエハの被覆剤塗布装置

Publications (2)

Publication Number Publication Date
JPS6085522A true JPS6085522A (ja) 1985-05-15
JPS6233738B2 JPS6233738B2 (enrdf_load_stackoverflow) 1987-07-22

Family

ID=16326278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19454383A Granted JPS6085522A (ja) 1983-10-17 1983-10-17 半導体ウエハの被覆剤塗布装置

Country Status (1)

Country Link
JP (1) JPS6085522A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6235623A (ja) * 1985-08-09 1987-02-16 Fujitsu Ltd 成形レジスト膜とその使用法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6235623A (ja) * 1985-08-09 1987-02-16 Fujitsu Ltd 成形レジスト膜とその使用法

Also Published As

Publication number Publication date
JPS6233738B2 (enrdf_load_stackoverflow) 1987-07-22

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