JPS6231490B2 - - Google Patents

Info

Publication number
JPS6231490B2
JPS6231490B2 JP54150324A JP15032479A JPS6231490B2 JP S6231490 B2 JPS6231490 B2 JP S6231490B2 JP 54150324 A JP54150324 A JP 54150324A JP 15032479 A JP15032479 A JP 15032479A JP S6231490 B2 JPS6231490 B2 JP S6231490B2
Authority
JP
Japan
Prior art keywords
substrate
exposure
light
processed
shutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54150324A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5673437A (en
Inventor
Koichi Kobayashi
Hiroshi Tokunaga
Kenji Sugishima
Takashi Uchama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15032479A priority Critical patent/JPS5673437A/ja
Publication of JPS5673437A publication Critical patent/JPS5673437A/ja
Publication of JPS6231490B2 publication Critical patent/JPS6231490B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP15032479A 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device Granted JPS5673437A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15032479A JPS5673437A (en) 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15032479A JPS5673437A (en) 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device

Publications (2)

Publication Number Publication Date
JPS5673437A JPS5673437A (en) 1981-06-18
JPS6231490B2 true JPS6231490B2 (enExample) 1987-07-08

Family

ID=15494523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15032479A Granted JPS5673437A (en) 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device

Country Status (1)

Country Link
JP (1) JPS5673437A (enExample)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (enExample) * 1971-08-25 1973-04-23
JPS4928363A (enExample) * 1972-07-05 1974-03-13
DE2539206A1 (de) * 1975-09-03 1977-03-17 Siemens Ag Verfahren zur automatischen justierung von halbleiterscheiben
JPS5277725A (en) * 1975-12-24 1977-06-30 Hitachi Ltd Automatic exposure circuit
JPS5366173A (en) * 1976-11-25 1978-06-13 Fujitsu Ltd Light exposure method
JPS53121471A (en) * 1977-03-31 1978-10-23 Nippon Chemical Ind Automatic position matching device
JPS53144270A (en) * 1977-05-23 1978-12-15 Hitachi Ltd Projection-type mask aligner
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator

Also Published As

Publication number Publication date
JPS5673437A (en) 1981-06-18

Similar Documents

Publication Publication Date Title
TW594431B (en) Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods
JP3637024B2 (ja) リソグラフィ装置
US5148214A (en) Alignment and exposure apparatus
US5160957A (en) Alignment and exposure apparatus
JP3186011B2 (ja) 投影露光装置及びデバイス製造方法
US5140366A (en) Exposure apparatus with a function for controlling alignment by use of latent images
US5262822A (en) Exposure method and apparatus
JP2000330294A (ja) リソグラフィ投影装置およびそれを用いたデバイス製造方法
JPS62145730A (ja) 投影型露光装置
GB2034059A (en) Manufacture of integrated circuits
US4624551A (en) Light irradiation control method for projection exposure apparatus
JP2000195786A (ja) 露光装置、露光方法およびデバイス製造方法
CN110320742B (zh) 光刻装置、图案形成方法以及物品的制造方法
JP4924421B2 (ja) センサの校正方法、露光方法、露光装置、デバイス製造方法、および反射型マスク
US5386269A (en) Alignment and exposure apparatus
JP4392914B2 (ja) 面位置検出装置、露光装置、およびデバイス製造方法
JP3466893B2 (ja) 位置合わせ装置及びそれを用いた投影露光装置
JP2001244183A (ja) 投影露光装置
JP3244783B2 (ja) 位置合わせ装置及び方法、並びにこれを用いた露光装置と半導体デバイス製造方法
JP3972121B2 (ja) リソグラフィ投影装置
CN101826454B (zh) 半导体装置的制造方法
JPH07130636A (ja) 位置検出装置及びそれを用いた半導体素子の製造方法
JP3651630B2 (ja) 投影露光方法及び投影露光装置
JP3428825B2 (ja) 面位置検出方法および面位置検出装置
JPH07219243A (ja) 露光装置の評価方法