JPS5673437A - Far-ultraviolet light exposing method and device - Google Patents

Far-ultraviolet light exposing method and device

Info

Publication number
JPS5673437A
JPS5673437A JP15032479A JP15032479A JPS5673437A JP S5673437 A JPS5673437 A JP S5673437A JP 15032479 A JP15032479 A JP 15032479A JP 15032479 A JP15032479 A JP 15032479A JP S5673437 A JPS5673437 A JP S5673437A
Authority
JP
Japan
Prior art keywords
mask
substrate
light
far
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15032479A
Other languages
English (en)
Other versions
JPS6231490B2 (ja
Inventor
Koichi Kobayashi
Hiroshi Tokunaga
Kenji Sugishima
Takashi Uchiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15032479A priority Critical patent/JPS5673437A/ja
Publication of JPS5673437A publication Critical patent/JPS5673437A/ja
Publication of JPS6231490B2 publication Critical patent/JPS6231490B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP15032479A 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device Granted JPS5673437A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15032479A JPS5673437A (en) 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15032479A JPS5673437A (en) 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device

Publications (2)

Publication Number Publication Date
JPS5673437A true JPS5673437A (en) 1981-06-18
JPS6231490B2 JPS6231490B2 (ja) 1987-07-08

Family

ID=15494523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15032479A Granted JPS5673437A (en) 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device

Country Status (1)

Country Link
JP (1) JPS5673437A (ja)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (ja) * 1971-08-25 1973-04-23
JPS4928363A (ja) * 1972-07-05 1974-03-13
JPS5230384A (en) * 1975-09-03 1977-03-08 Siemens Ag Method of automatically adjusting semiconductor plates
JPS5277725A (en) * 1975-12-24 1977-06-30 Hitachi Ltd Automatic exposure circuit
JPS5366173A (en) * 1976-11-25 1978-06-13 Fujitsu Ltd Light exposure method
JPS53121471A (en) * 1977-03-31 1978-10-23 Nippon Chemical Ind Automatic position matching device
JPS53144270A (en) * 1977-05-23 1978-12-15 Hitachi Ltd Projection-type mask aligner
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (ja) * 1971-08-25 1973-04-23
JPS4928363A (ja) * 1972-07-05 1974-03-13
JPS5230384A (en) * 1975-09-03 1977-03-08 Siemens Ag Method of automatically adjusting semiconductor plates
JPS5277725A (en) * 1975-12-24 1977-06-30 Hitachi Ltd Automatic exposure circuit
JPS5366173A (en) * 1976-11-25 1978-06-13 Fujitsu Ltd Light exposure method
JPS53121471A (en) * 1977-03-31 1978-10-23 Nippon Chemical Ind Automatic position matching device
JPS53144270A (en) * 1977-05-23 1978-12-15 Hitachi Ltd Projection-type mask aligner
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator

Also Published As

Publication number Publication date
JPS6231490B2 (ja) 1987-07-08

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