JPS4928363A - - Google Patents

Info

Publication number
JPS4928363A
JPS4928363A JP47067401A JP6740172A JPS4928363A JP S4928363 A JPS4928363 A JP S4928363A JP 47067401 A JP47067401 A JP 47067401A JP 6740172 A JP6740172 A JP 6740172A JP S4928363 A JPS4928363 A JP S4928363A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP47067401A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47067401A priority Critical patent/JPS4928363A/ja
Priority to US00366576A priority patent/US3853398A/en
Priority to DE2334325A priority patent/DE2334325C3/de
Priority to GB3199173A priority patent/GB1432865A/en
Publication of JPS4928363A publication Critical patent/JPS4928363A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP47067401A 1972-07-05 1972-07-05 Pending JPS4928363A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP47067401A JPS4928363A (ja) 1972-07-05 1972-07-05
US00366576A US3853398A (en) 1972-07-05 1973-06-04 Mask pattern printing device
DE2334325A DE2334325C3 (de) 1972-07-05 1973-07-05 Beleuchtungs- und Betrachtungseinrichtung einer Vorrichtung zum Kopieren eines Maskenmusters
GB3199173A GB1432865A (en) 1972-07-05 1973-07-05 Mask printing devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47067401A JPS4928363A (ja) 1972-07-05 1972-07-05

Publications (1)

Publication Number Publication Date
JPS4928363A true JPS4928363A (ja) 1974-03-13

Family

ID=13343879

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47067401A Pending JPS4928363A (ja) 1972-07-05 1972-07-05

Country Status (1)

Country Link
JP (1) JPS4928363A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5090414U (ja) * 1973-12-18 1975-07-31
JPS5228269A (en) * 1975-08-29 1977-03-03 Hitachi Ltd Process for mask alignment
JPS5673437A (en) * 1979-11-20 1981-06-18 Fujitsu Ltd Far-ultraviolet light exposing method and device
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
JPS5825638A (ja) * 1981-08-08 1983-02-15 Canon Inc 露光装置
JPS6079203A (ja) * 1983-10-07 1985-05-07 Yamatake Honeywell Co Ltd 反射型センサ

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3202041A (en) * 1960-03-17 1965-08-24 Zeiss Carl Optical device for orienting monocrystals along the axis of the crystal

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3202041A (en) * 1960-03-17 1965-08-24 Zeiss Carl Optical device for orienting monocrystals along the axis of the crystal

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5090414U (ja) * 1973-12-18 1975-07-31
JPS5228269A (en) * 1975-08-29 1977-03-03 Hitachi Ltd Process for mask alignment
JPS5673437A (en) * 1979-11-20 1981-06-18 Fujitsu Ltd Far-ultraviolet light exposing method and device
JPS6231490B2 (ja) * 1979-11-20 1987-07-08 Fujitsu Ltd
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
JPH0140490B2 (ja) * 1980-02-06 1989-08-29 Canon Kk
JPS5825638A (ja) * 1981-08-08 1983-02-15 Canon Inc 露光装置
JPS6079203A (ja) * 1983-10-07 1985-05-07 Yamatake Honeywell Co Ltd 反射型センサ

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