JPS5673437A - Far-ultraviolet light exposing method and device - Google Patents

Far-ultraviolet light exposing method and device

Info

Publication number
JPS5673437A
JPS5673437A JP15032479A JP15032479A JPS5673437A JP S5673437 A JPS5673437 A JP S5673437A JP 15032479 A JP15032479 A JP 15032479A JP 15032479 A JP15032479 A JP 15032479A JP S5673437 A JPS5673437 A JP S5673437A
Authority
JP
Japan
Prior art keywords
mask
substrate
light
far
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15032479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6231490B2 (enExample
Inventor
Koichi Kobayashi
Hiroshi Tokunaga
Kenji Sugishima
Takashi Uchiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15032479A priority Critical patent/JPS5673437A/ja
Publication of JPS5673437A publication Critical patent/JPS5673437A/ja
Publication of JPS6231490B2 publication Critical patent/JPS6231490B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP15032479A 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device Granted JPS5673437A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15032479A JPS5673437A (en) 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15032479A JPS5673437A (en) 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device

Publications (2)

Publication Number Publication Date
JPS5673437A true JPS5673437A (en) 1981-06-18
JPS6231490B2 JPS6231490B2 (enExample) 1987-07-08

Family

ID=15494523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15032479A Granted JPS5673437A (en) 1979-11-20 1979-11-20 Far-ultraviolet light exposing method and device

Country Status (1)

Country Link
JP (1) JPS5673437A (enExample)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (enExample) * 1971-08-25 1973-04-23
JPS4928363A (enExample) * 1972-07-05 1974-03-13
JPS5230384A (en) * 1975-09-03 1977-03-08 Siemens Ag Method of automatically adjusting semiconductor plates
JPS5277725A (en) * 1975-12-24 1977-06-30 Hitachi Ltd Automatic exposure circuit
JPS5366173A (en) * 1976-11-25 1978-06-13 Fujitsu Ltd Light exposure method
JPS53121471A (en) * 1977-03-31 1978-10-23 Nippon Chemical Ind Automatic position matching device
JPS53144270A (en) * 1977-05-23 1978-12-15 Hitachi Ltd Projection-type mask aligner
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (enExample) * 1971-08-25 1973-04-23
JPS4928363A (enExample) * 1972-07-05 1974-03-13
JPS5230384A (en) * 1975-09-03 1977-03-08 Siemens Ag Method of automatically adjusting semiconductor plates
JPS5277725A (en) * 1975-12-24 1977-06-30 Hitachi Ltd Automatic exposure circuit
JPS5366173A (en) * 1976-11-25 1978-06-13 Fujitsu Ltd Light exposure method
JPS53121471A (en) * 1977-03-31 1978-10-23 Nippon Chemical Ind Automatic position matching device
JPS53144270A (en) * 1977-05-23 1978-12-15 Hitachi Ltd Projection-type mask aligner
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator

Also Published As

Publication number Publication date
JPS6231490B2 (enExample) 1987-07-08

Similar Documents

Publication Publication Date Title
DE69133544T2 (de) Vorrichtung zur Projektion eines Maskenmusters auf ein Substrat
DE68928192T2 (de) Vorrichtung und Verfahren zur Positionsdetektion
CN101241318A (zh) 曝光装置、曝光方法,以及使用该曝光装置和方法的器件制造方法
JPS6489430A (en) Position aligning method
EP0343856A3 (en) Alignment of lithographic system
JPS57204547A (en) Exposing method
JPH021241B2 (enExample)
JPS647618A (en) Method and apparatus for exposing semiconductor
DE2539206A1 (de) Verfahren zur automatischen justierung von halbleiterscheiben
CN101174104A (zh) 确定光刻投影装置最佳物面和最佳像面的方法及相关装置
US6507439B1 (en) Microlens formation through focal plane control of an aerial image
DE3783661D1 (de) Anordnung zum positionieren der abbildung der struktur einer maske auf ein substrat.
GB2192467A (en) Controlled exposure
KR970077120A (ko) 노광 조건 측정 방법
JPH0629828B2 (ja) 光学系の試験方法及び光学系の試験方法に用いられる試験片
JPS5717132A (en) Formation of microscopic pattern using lithography and device thereof
JPS56111218A (en) Projection and exposuring device
JPH02157844A (ja) 露光条件測定用マスク並びに該マスクを用いた露光条件測定方法及び装置
JPS55113330A (en) X-ray exposure system and device
JP2647835B2 (ja) ウェハーの露光方法
JPS5612727A (en) Aligning device for ic projection exposure apparatus
JPS5431282A (en) Pattern formation method
JPS57179704A (en) Method and device for measuring length
GB2112933A (en) Positioning apparatus
JPS56146138A (en) Method and apparatus for exposing photomask