JPS6230492B2 - - Google Patents

Info

Publication number
JPS6230492B2
JPS6230492B2 JP54122859A JP12285979A JPS6230492B2 JP S6230492 B2 JPS6230492 B2 JP S6230492B2 JP 54122859 A JP54122859 A JP 54122859A JP 12285979 A JP12285979 A JP 12285979A JP S6230492 B2 JPS6230492 B2 JP S6230492B2
Authority
JP
Japan
Prior art keywords
resist
easily soluble
solvent
irradiation
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54122859A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5646530A (en
Inventor
Yoshitake Oonishi
Shigeyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP12285979A priority Critical patent/JPS5646530A/ja
Publication of JPS5646530A publication Critical patent/JPS5646530A/ja
Publication of JPS6230492B2 publication Critical patent/JPS6230492B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12285979A 1979-09-25 1979-09-25 Preparation of resist pattern Granted JPS5646530A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12285979A JPS5646530A (en) 1979-09-25 1979-09-25 Preparation of resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12285979A JPS5646530A (en) 1979-09-25 1979-09-25 Preparation of resist pattern

Publications (2)

Publication Number Publication Date
JPS5646530A JPS5646530A (en) 1981-04-27
JPS6230492B2 true JPS6230492B2 (cg-RX-API-DMAC7.html) 1987-07-02

Family

ID=14846398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12285979A Granted JPS5646530A (en) 1979-09-25 1979-09-25 Preparation of resist pattern

Country Status (1)

Country Link
JP (1) JPS5646530A (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59155921A (ja) * 1983-02-25 1984-09-05 Fujitsu Ltd レジストパタ−ンの形成方法
JPH0719061B2 (ja) * 1983-08-23 1995-03-06 三洋電機株式会社 レジストパタ−ン形成方法
JP2607486B2 (ja) * 1986-10-31 1997-05-07 株式会社日立製作所 パターン形成方法
JPH0727220B2 (ja) * 1988-03-08 1995-03-29 三洋電機株式会社 パターン形成方法
JPH02196241A (ja) * 1989-01-25 1990-08-02 Rohm Co Ltd レジストパターンの作成方法

Also Published As

Publication number Publication date
JPS5646530A (en) 1981-04-27

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