JPS6229915B2 - - Google Patents
Info
- Publication number
- JPS6229915B2 JPS6229915B2 JP55094607A JP9460780A JPS6229915B2 JP S6229915 B2 JPS6229915 B2 JP S6229915B2 JP 55094607 A JP55094607 A JP 55094607A JP 9460780 A JP9460780 A JP 9460780A JP S6229915 B2 JPS6229915 B2 JP S6229915B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- mask
- region
- nitride film
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000004767 nitrides Chemical class 0.000 claims description 41
- 238000005530 etching Methods 0.000 claims description 32
- 239000012535 impurity Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 5
- 238000009792 diffusion process Methods 0.000 claims description 4
- 239000010408 film Substances 0.000 claims 23
- 239000010409 thin film Substances 0.000 claims 7
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000992 sputter etching Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/202—FETs having static field-induced regions, e.g. static-induction transistors [SIT] or permeable base transistors [PBT]
Landscapes
- Bipolar Transistors (AREA)
- Semiconductor Integrated Circuits (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9460780A JPS5720446A (en) | 1980-07-11 | 1980-07-11 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9460780A JPS5720446A (en) | 1980-07-11 | 1980-07-11 | Manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5720446A JPS5720446A (en) | 1982-02-02 |
| JPS6229915B2 true JPS6229915B2 (enrdf_load_stackoverflow) | 1987-06-29 |
Family
ID=14114930
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9460780A Granted JPS5720446A (en) | 1980-07-11 | 1980-07-11 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5720446A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5563337A (en) * | 1994-10-12 | 1996-10-08 | Diagnetics, Inc. | Moisture monitor apparatus for a fluid system |
-
1980
- 1980-07-11 JP JP9460780A patent/JPS5720446A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5720446A (en) | 1982-02-02 |