JPS6214103B2 - - Google Patents
Info
- Publication number
- JPS6214103B2 JPS6214103B2 JP54110892A JP11089279A JPS6214103B2 JP S6214103 B2 JPS6214103 B2 JP S6214103B2 JP 54110892 A JP54110892 A JP 54110892A JP 11089279 A JP11089279 A JP 11089279A JP S6214103 B2 JPS6214103 B2 JP S6214103B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- gate
- main electrode
- impurity
- selectively
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11089279A JPS5635458A (en) | 1979-08-30 | 1979-08-30 | Manufacture of integrated circuit device |
| GB8027685A GB2057760B (en) | 1979-08-30 | 1980-08-27 | Integrated circuit device and method of making the same |
| US06/183,064 US4449284A (en) | 1979-08-30 | 1980-09-02 | Method of manufacturing an integrated circuit device having vertical field effect transistors |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11089279A JPS5635458A (en) | 1979-08-30 | 1979-08-30 | Manufacture of integrated circuit device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5635458A JPS5635458A (en) | 1981-04-08 |
| JPS6214103B2 true JPS6214103B2 (enrdf_load_stackoverflow) | 1987-03-31 |
Family
ID=14547324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11089279A Granted JPS5635458A (en) | 1979-08-30 | 1979-08-30 | Manufacture of integrated circuit device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5635458A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0714399B2 (ja) * | 1986-11-27 | 1995-02-22 | 政治 村井 | インプラント材植設用溝の穿設装置 |
| JPH07102215B2 (ja) * | 1987-03-06 | 1995-11-08 | 株式会社ニコン | 顎骨穿孔用ガイド装置 |
| JPH07102216B2 (ja) * | 1987-06-19 | 1995-11-08 | 株式会社ニコン | 顎骨穿孔用ガイド装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5235987A (en) * | 1975-09-16 | 1977-03-18 | Hitachi Ltd | Semiconductor integrated circuit |
| JPS5492078A (en) * | 1977-12-28 | 1979-07-20 | Seiko Instr & Electronics Ltd | Charge injection element |
-
1979
- 1979-08-30 JP JP11089279A patent/JPS5635458A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5635458A (en) | 1981-04-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2728671B2 (ja) | バイポーラトランジスタの製造方法 | |
| JP3205361B2 (ja) | 縦方向電流によるパワーmosトランジスタを製造するための方法 | |
| US4072974A (en) | Silicon resistive device for integrated circuits | |
| JP2503460B2 (ja) | バイポ−ラトランジスタおよびその製造方法 | |
| US4933737A (en) | Polysilon contacts to IC mesas | |
| JPH038343A (ja) | バイポーラトランジスタとその製造方法 | |
| JPH025432A (ja) | 半導体装置の製造方法 | |
| US4407059A (en) | Method of producing semiconductor device | |
| JPH0241170B2 (enrdf_load_stackoverflow) | ||
| US4379305A (en) | Mesh gate V-MOS power FET | |
| US4184172A (en) | Dielectric isolation using shallow oxide and polycrystalline silicon | |
| US4352238A (en) | Process for fabricating a vertical static induction device | |
| US5447883A (en) | Method of manufacturing semiconductor device | |
| JPS6214103B2 (enrdf_load_stackoverflow) | ||
| US4449284A (en) | Method of manufacturing an integrated circuit device having vertical field effect transistors | |
| EP0036620B1 (en) | Semiconductor device and method for fabricating the same | |
| JPS6393150A (ja) | 半導体装置及びその製造方法 | |
| JP2915002B2 (ja) | バイポーラ型半導体集積回路装置及びその製造方法 | |
| US5328856A (en) | Method for producing bipolar transistors having polysilicon contacted terminals | |
| JPH02152240A (ja) | 半導体装置の製造方法 | |
| JPH04287329A (ja) | ラテラルバイポーラトランジスタの製造方法 | |
| JPS6122476B2 (enrdf_load_stackoverflow) | ||
| JPH05275633A (ja) | 半導体装置及びその製造方法 | |
| JPS61147575A (ja) | 半導体装置の製造方法 | |
| JPS61201465A (ja) | トランジスタの製造方法 |