JPS62296591A - 半導体レ−ザ - Google Patents
半導体レ−ザInfo
- Publication number
- JPS62296591A JPS62296591A JP14172386A JP14172386A JPS62296591A JP S62296591 A JPS62296591 A JP S62296591A JP 14172386 A JP14172386 A JP 14172386A JP 14172386 A JP14172386 A JP 14172386A JP S62296591 A JPS62296591 A JP S62296591A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- semi
- insulating
- clad section
- conductive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 40
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 238000005253 cladding Methods 0.000 claims description 15
- 230000003071 parasitic effect Effects 0.000 abstract description 7
- 238000003486 chemical etching Methods 0.000 abstract description 5
- 238000000206 photolithography Methods 0.000 abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 6
- 229910052681 coesite Inorganic materials 0.000 abstract 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract 3
- 239000000377 silicon dioxide Substances 0.000 abstract 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract 3
- 229910052682 stishovite Inorganic materials 0.000 abstract 3
- 229910052905 tridymite Inorganic materials 0.000 abstract 3
- 239000000203 mixture Substances 0.000 description 8
- 239000013078 crystal Substances 0.000 description 5
- 230000010355 oscillation Effects 0.000 description 4
- 238000001947 vapour-phase growth Methods 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 240000002329 Inga feuillei Species 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002248 hydride vapour-phase epitaxy Methods 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Landscapes
- Semiconductor Lasers (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14172386A JPS62296591A (ja) | 1986-06-17 | 1986-06-17 | 半導体レ−ザ |
US07/063,056 US4791647A (en) | 1986-06-17 | 1987-06-17 | Semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14172386A JPS62296591A (ja) | 1986-06-17 | 1986-06-17 | 半導体レ−ザ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62296591A true JPS62296591A (ja) | 1987-12-23 |
JPH0543309B2 JPH0543309B2 (enrdf_load_stackoverflow) | 1993-07-01 |
Family
ID=15298705
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14172386A Granted JPS62296591A (ja) | 1986-06-17 | 1986-06-17 | 半導体レ−ザ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62296591A (enrdf_load_stackoverflow) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58102589A (ja) * | 1981-12-14 | 1983-06-18 | Fujitsu Ltd | 半導体発光装置 |
JPS60145691A (ja) * | 1984-01-10 | 1985-08-01 | Nec Corp | 半導体レ−ザ |
-
1986
- 1986-06-17 JP JP14172386A patent/JPS62296591A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58102589A (ja) * | 1981-12-14 | 1983-06-18 | Fujitsu Ltd | 半導体発光装置 |
JPS60145691A (ja) * | 1984-01-10 | 1985-08-01 | Nec Corp | 半導体レ−ザ |
Also Published As
Publication number | Publication date |
---|---|
JPH0543309B2 (enrdf_load_stackoverflow) | 1993-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS62296591A (ja) | 半導体レ−ザ | |
US5360763A (en) | Method for fabricating an optical semiconductor device | |
JPS6243193A (ja) | 半導体レ−ザ | |
JPH0682886B2 (ja) | 半導体レーザ装置の製造方法 | |
JP2973215B2 (ja) | 半導体レーザ装置 | |
JPS61220389A (ja) | 集積型半導体レ−ザ | |
JP2804533B2 (ja) | 半導体レーザの製造方法 | |
JPS6255990A (ja) | 半導体レ−ザ装置 | |
JPH0567849A (ja) | 半導体発光素子 | |
JPH0691295B2 (ja) | 半導体レ−ザ及び製造方法 | |
JPS6346790A (ja) | 埋込み型半導体レ−ザおよびその製造方法 | |
JP3235588B2 (ja) | 半導体レーザ装置およびその製造方法 | |
JP3075824B2 (ja) | 面発光型半導体レーザ装置とその製造方法 | |
JPH0330487A (ja) | 半導体レーザとその製造方法 | |
JPH05235477A (ja) | 光半導体素子の製造方法 | |
JPH0511437B2 (enrdf_load_stackoverflow) | ||
JPH02156591A (ja) | 半導体レーザ | |
JPS6245090A (ja) | 半導体レ−ザ装置 | |
JPS6044835B2 (ja) | 半導体発光素子 | |
JPH0685379A (ja) | 半導体レーザ素子およびその製造方法 | |
JPS62126685A (ja) | 半導体レ−ザの製造方法 | |
JPH06326399A (ja) | 半導体レーザ素子およびその製造方法 | |
JPH02130984A (ja) | 半導体レーザ装置 | |
JP2002076505A (ja) | 半導体レーザとその製造方法 | |
JPS62226674A (ja) | 発光ダイオ−ド |