JPS62279626A - 半導体用基板に対する不純物のド−ピング方法 - Google Patents

半導体用基板に対する不純物のド−ピング方法

Info

Publication number
JPS62279626A
JPS62279626A JP12317386A JP12317386A JPS62279626A JP S62279626 A JPS62279626 A JP S62279626A JP 12317386 A JP12317386 A JP 12317386A JP 12317386 A JP12317386 A JP 12317386A JP S62279626 A JPS62279626 A JP S62279626A
Authority
JP
Japan
Prior art keywords
stage
voltage
substrate
polarity
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12317386A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0516656B2 (enrdf_load_stackoverflow
Inventor
Keiki Wada
和田　啓喜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M SETETSUKU KK
Original Assignee
M SETETSUKU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M SETETSUKU KK filed Critical M SETETSUKU KK
Priority to JP12317386A priority Critical patent/JPS62279626A/ja
Publication of JPS62279626A publication Critical patent/JPS62279626A/ja
Publication of JPH0516656B2 publication Critical patent/JPH0516656B2/ja
Granted legal-status Critical Current

Links

JP12317386A 1986-05-27 1986-05-27 半導体用基板に対する不純物のド−ピング方法 Granted JPS62279626A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12317386A JPS62279626A (ja) 1986-05-27 1986-05-27 半導体用基板に対する不純物のド−ピング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12317386A JPS62279626A (ja) 1986-05-27 1986-05-27 半導体用基板に対する不純物のド−ピング方法

Publications (2)

Publication Number Publication Date
JPS62279626A true JPS62279626A (ja) 1987-12-04
JPH0516656B2 JPH0516656B2 (enrdf_load_stackoverflow) 1993-03-05

Family

ID=14853991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12317386A Granted JPS62279626A (ja) 1986-05-27 1986-05-27 半導体用基板に対する不純物のド−ピング方法

Country Status (1)

Country Link
JP (1) JPS62279626A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0220018A (ja) * 1988-07-08 1990-01-23 M Setetsuku Kk プラズマ処理装置の電極構造
JP2014107278A (ja) * 2012-11-22 2014-06-09 Shi Exaination & Inspection Ltd 半導体装置の製造方法、基板処理システム、及び基板処理装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5328378A (en) * 1976-08-27 1978-03-16 Handotai Kenkyu Shinkokai Method of plasma etching
JPS554937A (en) * 1978-06-27 1980-01-14 Fujitsu Ltd Dry etching method
JPS56138921A (en) * 1980-03-31 1981-10-29 Fujitsu Ltd Method of formation for impurity introduction layer
JPS57106120A (en) * 1980-12-24 1982-07-01 Fujitsu Ltd Manufacture of semiconductor device
JPS57197824A (en) * 1981-05-12 1982-12-04 Siemens Ag Method and device for filling impurity to semiconductor material
JPS57202726A (en) * 1981-06-05 1982-12-11 Mitsubishi Electric Corp Manufacture of semiconductor device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5328378A (en) * 1976-08-27 1978-03-16 Handotai Kenkyu Shinkokai Method of plasma etching
JPS554937A (en) * 1978-06-27 1980-01-14 Fujitsu Ltd Dry etching method
JPS56138921A (en) * 1980-03-31 1981-10-29 Fujitsu Ltd Method of formation for impurity introduction layer
JPS57106120A (en) * 1980-12-24 1982-07-01 Fujitsu Ltd Manufacture of semiconductor device
JPS57197824A (en) * 1981-05-12 1982-12-04 Siemens Ag Method and device for filling impurity to semiconductor material
JPS57202726A (en) * 1981-06-05 1982-12-11 Mitsubishi Electric Corp Manufacture of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0220018A (ja) * 1988-07-08 1990-01-23 M Setetsuku Kk プラズマ処理装置の電極構造
JP2014107278A (ja) * 2012-11-22 2014-06-09 Shi Exaination & Inspection Ltd 半導体装置の製造方法、基板処理システム、及び基板処理装置

Also Published As

Publication number Publication date
JPH0516656B2 (enrdf_load_stackoverflow) 1993-03-05

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