JPS62276556A - 光源移動型露光装置 - Google Patents

光源移動型露光装置

Info

Publication number
JPS62276556A
JPS62276556A JP61119899A JP11989986A JPS62276556A JP S62276556 A JPS62276556 A JP S62276556A JP 61119899 A JP61119899 A JP 61119899A JP 11989986 A JP11989986 A JP 11989986A JP S62276556 A JPS62276556 A JP S62276556A
Authority
JP
Japan
Prior art keywords
light
light source
exposed
exposure
parabolic mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61119899A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0469942B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Yoshio Yazaki
矢崎　好夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OAK SEISAKUSHO KK
Orc Manufacturing Co Ltd
Original Assignee
OAK SEISAKUSHO KK
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OAK SEISAKUSHO KK, Orc Manufacturing Co Ltd filed Critical OAK SEISAKUSHO KK
Priority to JP61119899A priority Critical patent/JPS62276556A/ja
Priority to US06/884,516 priority patent/US4682277A/en
Publication of JPS62276556A publication Critical patent/JPS62276556A/ja
Publication of JPH0469942B2 publication Critical patent/JPH0469942B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61119899A 1986-05-24 1986-05-24 光源移動型露光装置 Granted JPS62276556A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP61119899A JPS62276556A (ja) 1986-05-24 1986-05-24 光源移動型露光装置
US06/884,516 US4682277A (en) 1986-05-24 1986-07-11 Movable light source type exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61119899A JPS62276556A (ja) 1986-05-24 1986-05-24 光源移動型露光装置

Publications (2)

Publication Number Publication Date
JPS62276556A true JPS62276556A (ja) 1987-12-01
JPH0469942B2 JPH0469942B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-11-09

Family

ID=14772976

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61119899A Granted JPS62276556A (ja) 1986-05-24 1986-05-24 光源移動型露光装置

Country Status (2)

Country Link
US (1) US4682277A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS62276556A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004309670A (ja) * 2003-04-04 2004-11-04 Adtec Engineeng Co Ltd 搬送システムを備えた露光装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4894683A (en) * 1988-12-05 1990-01-16 Eastman Kodak Company Variable brightness light generators
US4912505A (en) * 1989-03-23 1990-03-27 The Mead Corporation Contrast control device for a slit-type copier exposure system
US5608773A (en) * 1993-11-30 1997-03-04 Canon Kabushiki Kaisha Mask holding device, and an exposure apparatus and a device manufacturing method using the device
CN117406558B (zh) * 2023-11-03 2024-07-05 苏州天准科技股份有限公司 一种侧面曝光装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3042795A (en) * 1958-10-01 1962-07-03 Nord Photocopy And Electronics Photocopy machine
JPS5922932B2 (ja) * 1977-01-24 1984-05-30 株式会社リコー 変倍複写機における照度むら補正装置
NL7808977A (nl) * 1978-09-01 1978-11-30 Oce Nederland Bv Belichtingsinrichting.
US4215935A (en) * 1979-05-24 1980-08-05 Loebach Ernst W Method and device for the projection printing of a mask onto a semiconductor substrate
US4378583A (en) * 1980-12-10 1983-03-29 Rca Corporation Xenon flash lamp shield
US4348105A (en) * 1981-04-30 1982-09-07 Rca Corporation Radiation shadow projection exposure system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004309670A (ja) * 2003-04-04 2004-11-04 Adtec Engineeng Co Ltd 搬送システムを備えた露光装置

Also Published As

Publication number Publication date
JPH0469942B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-11-09
US4682277A (en) 1987-07-21

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