JPS622698B2 - - Google Patents

Info

Publication number
JPS622698B2
JPS622698B2 JP10373281A JP10373281A JPS622698B2 JP S622698 B2 JPS622698 B2 JP S622698B2 JP 10373281 A JP10373281 A JP 10373281A JP 10373281 A JP10373281 A JP 10373281A JP S622698 B2 JPS622698 B2 JP S622698B2
Authority
JP
Japan
Prior art keywords
observation window
bell gear
gas
vapor phase
phase growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10373281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS586124A (ja
Inventor
Kotei Iwata
Yoshihiko Myazaki
Juji Matsunaga
Kichizo Komyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP10373281A priority Critical patent/JPS586124A/ja
Publication of JPS586124A publication Critical patent/JPS586124A/ja
Publication of JPS622698B2 publication Critical patent/JPS622698B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP10373281A 1981-07-02 1981-07-02 半導体気相成長装置 Granted JPS586124A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10373281A JPS586124A (ja) 1981-07-02 1981-07-02 半導体気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10373281A JPS586124A (ja) 1981-07-02 1981-07-02 半導体気相成長装置

Publications (2)

Publication Number Publication Date
JPS586124A JPS586124A (ja) 1983-01-13
JPS622698B2 true JPS622698B2 (enrdf_load_stackoverflow) 1987-01-21

Family

ID=14361807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10373281A Granted JPS586124A (ja) 1981-07-02 1981-07-02 半導体気相成長装置

Country Status (1)

Country Link
JP (1) JPS586124A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019083051A1 (ja) * 2017-10-28 2019-05-02 ｍｕｉ Ｌａｂ株式会社 操作表示パネル組込物品

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6097622A (ja) * 1983-11-01 1985-05-31 Toshiba Mach Co Ltd エピタキシヤル装置
US6390019B1 (en) * 1998-06-11 2002-05-21 Applied Materials, Inc. Chamber having improved process monitoring window
US6306246B1 (en) * 2000-01-14 2001-10-23 Advanced Micro Devices, Inc. Dual window optical port for improved end point detection
US6863772B2 (en) * 2002-10-09 2005-03-08 Taiwan Semiconductor Manufacturing Co., Ltd Dual-port end point window for plasma etcher
JP4026529B2 (ja) * 2003-04-10 2007-12-26 東京エレクトロン株式会社 シャワーヘッド構造及び処理装置
JP4909613B2 (ja) * 2006-03-27 2012-04-04 大陽日酸株式会社 気相成長装置
US20110256692A1 (en) * 2010-04-14 2011-10-20 Applied Materials, Inc. Multiple precursor concentric delivery showerhead

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019083051A1 (ja) * 2017-10-28 2019-05-02 ｍｕｉ Ｌａｂ株式会社 操作表示パネル組込物品

Also Published As

Publication number Publication date
JPS586124A (ja) 1983-01-13

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