JPS586124A - 半導体気相成長装置 - Google Patents

半導体気相成長装置

Info

Publication number
JPS586124A
JPS586124A JP10373281A JP10373281A JPS586124A JP S586124 A JPS586124 A JP S586124A JP 10373281 A JP10373281 A JP 10373281A JP 10373281 A JP10373281 A JP 10373281A JP S586124 A JPS586124 A JP S586124A
Authority
JP
Japan
Prior art keywords
observation window
gas
bell jar
temperature sensor
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10373281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS622698B2 (enrdf_load_stackoverflow
Inventor
Kotei Iwata
岩田　公弟
Yoshihiko Miyazaki
宮崎　美彦
Juji Matsunaga
松永　重次
Kichizo Komiyama
吉三 小宮山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP10373281A priority Critical patent/JPS586124A/ja
Publication of JPS586124A publication Critical patent/JPS586124A/ja
Publication of JPS622698B2 publication Critical patent/JPS622698B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP10373281A 1981-07-02 1981-07-02 半導体気相成長装置 Granted JPS586124A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10373281A JPS586124A (ja) 1981-07-02 1981-07-02 半導体気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10373281A JPS586124A (ja) 1981-07-02 1981-07-02 半導体気相成長装置

Publications (2)

Publication Number Publication Date
JPS586124A true JPS586124A (ja) 1983-01-13
JPS622698B2 JPS622698B2 (enrdf_load_stackoverflow) 1987-01-21

Family

ID=14361807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10373281A Granted JPS586124A (ja) 1981-07-02 1981-07-02 半導体気相成長装置

Country Status (1)

Country Link
JP (1) JPS586124A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4641603A (en) * 1983-11-01 1987-02-10 Toshiba Kikai Kabushiki Kaisha Epitaxial growing apparatus
US6306246B1 (en) * 2000-01-14 2001-10-23 Advanced Micro Devices, Inc. Dual window optical port for improved end point detection
US6712927B1 (en) * 1998-06-11 2004-03-30 Applied Materials Inc. Chamber having process monitoring window
WO2004090961A1 (ja) * 2003-04-10 2004-10-21 Tokyo Electron Limited シャワーヘッド構造及び処理装置
US6863772B2 (en) * 2002-10-09 2005-03-08 Taiwan Semiconductor Manufacturing Co., Ltd Dual-port end point window for plasma etcher
JP2007258633A (ja) * 2006-03-27 2007-10-04 Taiyo Nippon Sanso Corp 気相成長装置
US20110253044A1 (en) * 2010-04-14 2011-10-20 Applied Materials, Inc. Showerhead assembly with metrology port purge

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019082399A1 (ja) * 2017-10-28 2019-05-02 ｍｕｉ Ｌａｂ株式会社 操作表示パネル組込物品

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4641603A (en) * 1983-11-01 1987-02-10 Toshiba Kikai Kabushiki Kaisha Epitaxial growing apparatus
US6712927B1 (en) * 1998-06-11 2004-03-30 Applied Materials Inc. Chamber having process monitoring window
US6306246B1 (en) * 2000-01-14 2001-10-23 Advanced Micro Devices, Inc. Dual window optical port for improved end point detection
US6863772B2 (en) * 2002-10-09 2005-03-08 Taiwan Semiconductor Manufacturing Co., Ltd Dual-port end point window for plasma etcher
WO2004090961A1 (ja) * 2003-04-10 2004-10-21 Tokyo Electron Limited シャワーヘッド構造及び処理装置
US8070910B2 (en) 2003-04-10 2011-12-06 Tokyo Electron Limited Shower head structure and treating device
JP2007258633A (ja) * 2006-03-27 2007-10-04 Taiyo Nippon Sanso Corp 気相成長装置
US20110253044A1 (en) * 2010-04-14 2011-10-20 Applied Materials, Inc. Showerhead assembly with metrology port purge

Also Published As

Publication number Publication date
JPS622698B2 (enrdf_load_stackoverflow) 1987-01-21

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