JPS62267742A - 半導体製造方法 - Google Patents
半導体製造方法Info
- Publication number
- JPS62267742A JPS62267742A JP61113010A JP11301086A JPS62267742A JP S62267742 A JPS62267742 A JP S62267742A JP 61113010 A JP61113010 A JP 61113010A JP 11301086 A JP11301086 A JP 11301086A JP S62267742 A JPS62267742 A JP S62267742A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- ultrapure water
- particles
- cleaning
- liquefied nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61113010A JPS62267742A (ja) | 1986-05-15 | 1986-05-15 | 半導体製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61113010A JPS62267742A (ja) | 1986-05-15 | 1986-05-15 | 半導体製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62267742A true JPS62267742A (ja) | 1987-11-20 |
| JPH0466500B2 JPH0466500B2 (OSRAM) | 1992-10-23 |
Family
ID=14601174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61113010A Granted JPS62267742A (ja) | 1986-05-15 | 1986-05-15 | 半導体製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62267742A (OSRAM) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01207182A (ja) * | 1988-02-15 | 1989-08-21 | Taiyo Sanso Co Ltd | 基板表面の洗浄装置 |
| JPH02270322A (ja) * | 1989-04-11 | 1990-11-05 | Taiyo Sanso Co Ltd | 半導体ウェハの洗浄装置 |
| JPH05152269A (ja) * | 1991-03-18 | 1993-06-18 | Taiyo Sanso Co Ltd | 表面処理装置 |
| KR100699787B1 (ko) | 2004-09-13 | 2007-03-27 | 다이니폰 스크린 세이조우 가부시키가이샤 | 기판 처리 방법 및 기판 처리 장치 |
-
1986
- 1986-05-15 JP JP61113010A patent/JPS62267742A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01207182A (ja) * | 1988-02-15 | 1989-08-21 | Taiyo Sanso Co Ltd | 基板表面の洗浄装置 |
| JPH02270322A (ja) * | 1989-04-11 | 1990-11-05 | Taiyo Sanso Co Ltd | 半導体ウェハの洗浄装置 |
| JPH05152269A (ja) * | 1991-03-18 | 1993-06-18 | Taiyo Sanso Co Ltd | 表面処理装置 |
| KR100699787B1 (ko) | 2004-09-13 | 2007-03-27 | 다이니폰 스크린 세이조우 가부시키가이샤 | 기판 처리 방법 및 기판 처리 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0466500B2 (OSRAM) | 1992-10-23 |
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