JPS6226173B2 - - Google Patents
Info
- Publication number
- JPS6226173B2 JPS6226173B2 JP9628681A JP9628681A JPS6226173B2 JP S6226173 B2 JPS6226173 B2 JP S6226173B2 JP 9628681 A JP9628681 A JP 9628681A JP 9628681 A JP9628681 A JP 9628681A JP S6226173 B2 JPS6226173 B2 JP S6226173B2
- Authority
- JP
- Japan
- Prior art keywords
- signal
- output signal
- electron beam
- converter
- mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 14
- 238000001514 detection method Methods 0.000 claims description 10
- 238000010586 diagram Methods 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9628681A JPS57211231A (en) | 1981-06-22 | 1981-06-22 | Mark detector for electron beam exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9628681A JPS57211231A (en) | 1981-06-22 | 1981-06-22 | Mark detector for electron beam exposure device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57211231A JPS57211231A (en) | 1982-12-25 |
| JPS6226173B2 true JPS6226173B2 (enrdf_load_stackoverflow) | 1987-06-08 |
Family
ID=14160846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9628681A Granted JPS57211231A (en) | 1981-06-22 | 1981-06-22 | Mark detector for electron beam exposure device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57211231A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58122725A (ja) * | 1982-01-14 | 1983-07-21 | Nippon Telegr & Teleph Corp <Ntt> | ビ−ム形状測定装置 |
-
1981
- 1981-06-22 JP JP9628681A patent/JPS57211231A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57211231A (en) | 1982-12-25 |
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