JPS622610Y2 - - Google Patents
Info
- Publication number
- JPS622610Y2 JPS622610Y2 JP1979156605U JP15660579U JPS622610Y2 JP S622610 Y2 JPS622610 Y2 JP S622610Y2 JP 1979156605 U JP1979156605 U JP 1979156605U JP 15660579 U JP15660579 U JP 15660579U JP S622610 Y2 JPS622610 Y2 JP S622610Y2
- Authority
- JP
- Japan
- Prior art keywords
- film
- ray
- polymer film
- transparent
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010410 layer Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 7
- 239000002356 single layer Substances 0.000 claims description 4
- 238000002834 transmittance Methods 0.000 claims description 3
- 239000012780 transparent material Substances 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims 1
- 229920006254 polymer film Polymers 0.000 description 28
- 239000000758 substrate Substances 0.000 description 11
- 239000004642 Polyimide Substances 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1979156605U JPS622610Y2 (enrdf_load_stackoverflow) | 1979-11-12 | 1979-11-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1979156605U JPS622610Y2 (enrdf_load_stackoverflow) | 1979-11-12 | 1979-11-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5675747U JPS5675747U (enrdf_load_stackoverflow) | 1981-06-20 |
| JPS622610Y2 true JPS622610Y2 (enrdf_load_stackoverflow) | 1987-01-21 |
Family
ID=29668026
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1979156605U Expired JPS622610Y2 (enrdf_load_stackoverflow) | 1979-11-12 | 1979-11-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS622610Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0723959B2 (ja) * | 1985-07-31 | 1995-03-15 | 株式会社日立製作所 | パタ−ン転写用マスクおよび使用方法 |
-
1979
- 1979-11-12 JP JP1979156605U patent/JPS622610Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5675747U (enrdf_load_stackoverflow) | 1981-06-20 |
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