JPS6223087Y2 - - Google Patents
Info
- Publication number
- JPS6223087Y2 JPS6223087Y2 JP1982042971U JP4297182U JPS6223087Y2 JP S6223087 Y2 JPS6223087 Y2 JP S6223087Y2 JP 1982042971 U JP1982042971 U JP 1982042971U JP 4297182 U JP4297182 U JP 4297182U JP S6223087 Y2 JPS6223087 Y2 JP S6223087Y2
- Authority
- JP
- Japan
- Prior art keywords
- tray
- wafer
- air
- semiconductor wafer
- wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Delivering By Means Of Belts And Rollers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4297182U JPS58144841U (ja) | 1982-03-25 | 1982-03-25 | 半導体製造装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4297182U JPS58144841U (ja) | 1982-03-25 | 1982-03-25 | 半導体製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58144841U JPS58144841U (ja) | 1983-09-29 |
JPS6223087Y2 true JPS6223087Y2 (enrdf_load_stackoverflow) | 1987-06-12 |
Family
ID=30054069
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4297182U Granted JPS58144841U (ja) | 1982-03-25 | 1982-03-25 | 半導体製造装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58144841U (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090179160A1 (en) * | 2008-01-16 | 2009-07-16 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor substrate manufacturing apparatus |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5121474A (ja) * | 1974-08-15 | 1976-02-20 | Mitsubishi Electric Corp | Handotaiuehatoriatsukaisochi |
-
1982
- 1982-03-25 JP JP4297182U patent/JPS58144841U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58144841U (ja) | 1983-09-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6190645B2 (ja) | 基板搬送方法 | |
TWI485798B (zh) | 基板處理裝置 | |
KR970008323B1 (ko) | 처리가공이 가스베이스 기판 후면을 보호하는 장치 및 방법 | |
US9324597B2 (en) | Vertical inline CVD system | |
US20080129064A1 (en) | Bernoulli wand | |
JP2001510279A (ja) | 基材冷却装置 | |
US20080025835A1 (en) | Bernoulli wand | |
KR940020507A (ko) | 처리 시스템(process system) | |
JP2009088222A (ja) | 基板保持装置、基板保持方法、半導体製造装置及び記憶媒体 | |
JP2008159782A (ja) | 減圧乾燥装置 | |
CN104271474A (zh) | 输送设备 | |
KR20190036476A (ko) | 기판 처리 장치, 기판 처리 방법 및 컴퓨터 기억 매체 | |
TW202101542A (zh) | 處理裝置(二) | |
WO2018171909A1 (en) | Apparatus and method for holding a substrate, apparatus and method for loading a substrate into a vacuum processing module, and system for vacuum processing of a substrate | |
JPS6223087Y2 (enrdf_load_stackoverflow) | ||
JP7387129B2 (ja) | 成膜用冶具及び常圧気相成長装置 | |
JP2023039920A (ja) | Efemを含むウェーハ処理装置及びウェーハ処理方法 | |
JPH019162Y2 (enrdf_load_stackoverflow) | ||
JP2926592B2 (ja) | 基板処理装置 | |
CN102969223B (zh) | 基板处理设备及基板处理方法 | |
KR102817950B1 (ko) | 패브리케이션 라인 | |
JPH05226457A (ja) | 搬送装置 | |
CN102804357A (zh) | 用于在玻璃板上沉积半导体材料的设备 | |
JPH0590387A (ja) | 処理装置 | |
CN119547184A (zh) | 基板处理装置和基板处理方法 |