JPS62219444A - エレクトロンビ−ム蒸着器のエレクトロンビ−ム制御回路 - Google Patents
エレクトロンビ−ム蒸着器のエレクトロンビ−ム制御回路Info
- Publication number
- JPS62219444A JPS62219444A JP62051176A JP5117687A JPS62219444A JP S62219444 A JPS62219444 A JP S62219444A JP 62051176 A JP62051176 A JP 62051176A JP 5117687 A JP5117687 A JP 5117687A JP S62219444 A JPS62219444 A JP S62219444A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- focusing
- axis
- square root
- amplifiers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title claims description 34
- 238000000605 extraction Methods 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims 1
- 238000006073 displacement reaction Methods 0.000 claims 1
- 230000001133 acceleration Effects 0.000 description 5
- 230000001105 regulatory effect Effects 0.000 description 3
- 230000003750 conditioning effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000013598 vector Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BG8673938A BG45024A1 (enExample) | 1986-03-06 | 1986-03-06 | |
| BG73938 | 1986-03-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62219444A true JPS62219444A (ja) | 1987-09-26 |
Family
ID=3916884
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62051176A Pending JPS62219444A (ja) | 1986-03-06 | 1987-03-05 | エレクトロンビ−ム蒸着器のエレクトロンビ−ム制御回路 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4980615A (enExample) |
| JP (1) | JPS62219444A (enExample) |
| BG (1) | BG45024A1 (enExample) |
| DD (1) | DD274347A7 (enExample) |
| DE (1) | DE3706269A1 (enExample) |
| FR (1) | FR2595505B3 (enExample) |
| HU (1) | HUT43910A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3706495A1 (de) * | 1987-04-29 | 1988-09-15 | Vtu Angel Kancev | Stromversorgungsschaltung fuer elektronenstrahl-verdampfer |
| US6707429B1 (en) * | 2002-12-09 | 2004-03-16 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Self-contained sub-millimeter wave rectifying antenna integrated circuit |
| CN115464246B (zh) * | 2022-09-26 | 2023-12-22 | 河北众航高能科技有限公司 | 一种电子束聚焦磁透镜驱动电路及其电子束焊接设备 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3371185A (en) * | 1964-10-05 | 1968-02-27 | United Aircraft Corp | Electron beam maintenance device |
| DE1639010A1 (de) * | 1967-09-04 | 1971-01-21 | Elektromat Veb | Verfahren zur Regelung eines magnetisch fokussierten und ablenkbaren Ladungstraegerstrahles,insbesondere groesserer Leistung |
| US3714505A (en) * | 1970-12-01 | 1973-01-30 | Bell Telephone Labor Inc | Dynamic focus correction apparatus for a rectilinearly raster scanned electron beam |
| US3952228A (en) * | 1974-11-18 | 1976-04-20 | Ion Tech, Inc. | Electron-bombardment ion source including alternating potential means for cyclically varying the focussing of ion beamlets |
| US4039899A (en) * | 1976-05-03 | 1977-08-02 | Tektronix, Inc. | Geometry and focus correction circuit |
| SU1050011A1 (ru) * | 1982-07-16 | 1983-10-23 | Институт Проблем Литья Усср | Устройство стабилизации фокусировки электронного луча в электронно-лучевой установке |
-
1986
- 1986-03-06 BG BG8673938A patent/BG45024A1/xx unknown
-
1987
- 1987-02-20 DD DD87300087A patent/DD274347A7/de not_active IP Right Cessation
- 1987-02-25 HU HU87729A patent/HUT43910A/hu unknown
- 1987-02-26 DE DE19873706269 patent/DE3706269A1/de not_active Withdrawn
- 1987-03-05 JP JP62051176A patent/JPS62219444A/ja active Pending
- 1987-03-06 FR FR8703100A patent/FR2595505B3/fr not_active Expired
-
1989
- 1989-05-25 US US07/357,396 patent/US4980615A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| BG45024A1 (enExample) | 1989-03-15 |
| US4980615A (en) | 1990-12-25 |
| FR2595505A1 (fr) | 1987-09-11 |
| FR2595505B3 (fr) | 1988-08-26 |
| HUT43910A (en) | 1987-12-28 |
| DE3706269A1 (de) | 1987-09-17 |
| DD274347A7 (de) | 1989-12-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0051733B1 (en) | Electron beam projection system | |
| US3930181A (en) | Lens and deflection unit arrangement for electron beam columns | |
| US3753034A (en) | Electron beam apparatus | |
| EP0039688B1 (en) | Sextupole system for the correction of spherical aberration | |
| US2547994A (en) | Electronic microscope | |
| US4590379A (en) | Achromatic deflector and quadrupole lens | |
| EP0179294A1 (en) | Ion microbeam apparatus | |
| JPS62219444A (ja) | エレクトロンビ−ム蒸着器のエレクトロンビ−ム制御回路 | |
| US4249112A (en) | Dynamic focus and astigmatism correction circuit | |
| EP0596529A1 (en) | Electron lens | |
| US4097745A (en) | High resolution matrix lens electron optical system | |
| US4090077A (en) | Particle beam device with a deflection system and a stigmator | |
| JPS5922325A (ja) | 電子ビ−ム描画装置 | |
| JPH03276547A (ja) | レンズ非対称性補正装置と一体化した電子レンズ | |
| JPS63231852A (ja) | 荷電粒子線応用装置 | |
| US3585384A (en) | Ionic microanalyzers | |
| KR830002441B1 (ko) | 전자선 장치의 자동축(軸) 맞춤장치 | |
| SU949737A1 (ru) | Электромагнитное устройство дл модул ции тока электронного пучка | |
| JPS613098A (ja) | 荷電ビ−ム装置 | |
| JPH0260042A (ja) | 荷電粒子線応用装置の駆動電源 | |
| SU1156167A1 (ru) | Способ контрол качества электронно-оптических систем | |
| US3896339A (en) | Device for focussing and deflection of an electron beam in a cathode-ray apparatus | |
| JP2700002B2 (ja) | 荷電粒子光学系 | |
| KANAYA et al. | Deflection system with eight-pole stigmator used in correcting astigmatism | |
| Colman et al. | Ion optics of the Melbourne University 5U Pelletron |