JPS6221869B2 - - Google Patents

Info

Publication number
JPS6221869B2
JPS6221869B2 JP56179728A JP17972881A JPS6221869B2 JP S6221869 B2 JPS6221869 B2 JP S6221869B2 JP 56179728 A JP56179728 A JP 56179728A JP 17972881 A JP17972881 A JP 17972881A JP S6221869 B2 JPS6221869 B2 JP S6221869B2
Authority
JP
Japan
Prior art keywords
gas
replenishment
heating table
nozzle
supplementary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56179728A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5881437A (ja
Inventor
Hironori Inoe
Takashi Aoyama
Takaya Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP17972881A priority Critical patent/JPS5881437A/ja
Publication of JPS5881437A publication Critical patent/JPS5881437A/ja
Publication of JPS6221869B2 publication Critical patent/JPS6221869B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP17972881A 1981-11-11 1981-11-11 気相成長装置 Granted JPS5881437A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17972881A JPS5881437A (ja) 1981-11-11 1981-11-11 気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17972881A JPS5881437A (ja) 1981-11-11 1981-11-11 気相成長装置

Publications (2)

Publication Number Publication Date
JPS5881437A JPS5881437A (ja) 1983-05-16
JPS6221869B2 true JPS6221869B2 (https=) 1987-05-14

Family

ID=16070825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17972881A Granted JPS5881437A (ja) 1981-11-11 1981-11-11 気相成長装置

Country Status (1)

Country Link
JP (1) JPS5881437A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013507004A (ja) * 2009-10-05 2013-02-28 アプライド マテリアルズ インコーポレイテッド クロスフローを有するエピタキシャルチャンバ

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11288893A (ja) 1998-04-03 1999-10-19 Nec Corp 半導体製造装置及び半導体装置の製造方法
CN103540912B (zh) * 2012-07-09 2016-06-08 中晟光电设备（上海）股份有限公司 Mocvd设备及该设备中的托盘支撑旋转系统
CN106006647B (zh) * 2016-05-17 2018-03-13 山东瑞川硅业有限公司 三氯氢硅合成炉

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4834926U (https=) * 1971-08-26 1973-04-26

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013507004A (ja) * 2009-10-05 2013-02-28 アプライド マテリアルズ インコーポレイテッド クロスフローを有するエピタキシャルチャンバ
US9127360B2 (en) 2009-10-05 2015-09-08 Applied Materials, Inc. Epitaxial chamber with cross flow

Also Published As

Publication number Publication date
JPS5881437A (ja) 1983-05-16

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