JPS62190726A - 位置合わせ装置 - Google Patents

位置合わせ装置

Info

Publication number
JPS62190726A
JPS62190726A JP61032379A JP3237986A JPS62190726A JP S62190726 A JPS62190726 A JP S62190726A JP 61032379 A JP61032379 A JP 61032379A JP 3237986 A JP3237986 A JP 3237986A JP S62190726 A JPS62190726 A JP S62190726A
Authority
JP
Japan
Prior art keywords
wafer
mask
detector
repeating pattern
repeating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61032379A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0230172B2 (enExample
Inventor
Hiroshi Uehara
洋 上原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP61032379A priority Critical patent/JPS62190726A/ja
Publication of JPS62190726A publication Critical patent/JPS62190726A/ja
Publication of JPH0230172B2 publication Critical patent/JPH0230172B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61032379A 1986-02-17 1986-02-17 位置合わせ装置 Granted JPS62190726A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61032379A JPS62190726A (ja) 1986-02-17 1986-02-17 位置合わせ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61032379A JPS62190726A (ja) 1986-02-17 1986-02-17 位置合わせ装置

Publications (2)

Publication Number Publication Date
JPS62190726A true JPS62190726A (ja) 1987-08-20
JPH0230172B2 JPH0230172B2 (enExample) 1990-07-04

Family

ID=12357317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61032379A Granted JPS62190726A (ja) 1986-02-17 1986-02-17 位置合わせ装置

Country Status (1)

Country Link
JP (1) JPS62190726A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6910944B2 (en) 1995-03-28 2005-06-28 Applied Materials, Inc. Method of forming a transparent window in a polishing pad
US7264536B2 (en) 2003-09-23 2007-09-04 Applied Materials, Inc. Polishing pad with window
US7731566B2 (en) 1995-03-28 2010-06-08 Applied Materials, Inc. Substrate polishing metrology using interference signals

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6910944B2 (en) 1995-03-28 2005-06-28 Applied Materials, Inc. Method of forming a transparent window in a polishing pad
US7011565B2 (en) 1995-03-28 2006-03-14 Applied Materials, Inc. Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
US7118450B2 (en) 1995-03-28 2006-10-10 Applied Materials, Inc. Polishing pad with window and method of fabricating a window in a polishing pad
US7255629B2 (en) 1995-03-28 2007-08-14 Applied Materials, Inc. Polishing assembly with a window
US7731566B2 (en) 1995-03-28 2010-06-08 Applied Materials, Inc. Substrate polishing metrology using interference signals
US7841926B2 (en) 1995-03-28 2010-11-30 Applied Materials, Inc. Substrate polishing metrology using interference signals
US8092274B2 (en) 1995-03-28 2012-01-10 Applied Materials, Inc. Substrate polishing metrology using interference signals
US8556679B2 (en) 1995-03-28 2013-10-15 Applied Materials, Inc. Substrate polishing metrology using interference signals
US7264536B2 (en) 2003-09-23 2007-09-04 Applied Materials, Inc. Polishing pad with window
US7547243B2 (en) 2003-09-23 2009-06-16 Applied Materials, Inc. Method of making and apparatus having polishing pad with window

Also Published As

Publication number Publication date
JPH0230172B2 (enExample) 1990-07-04

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