JPH0230172B2 - - Google Patents

Info

Publication number
JPH0230172B2
JPH0230172B2 JP61032379A JP3237986A JPH0230172B2 JP H0230172 B2 JPH0230172 B2 JP H0230172B2 JP 61032379 A JP61032379 A JP 61032379A JP 3237986 A JP3237986 A JP 3237986A JP H0230172 B2 JPH0230172 B2 JP H0230172B2
Authority
JP
Japan
Prior art keywords
repeating pattern
wafer
mask
pitch
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61032379A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62190726A (ja
Inventor
Hiroshi Uehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP61032379A priority Critical patent/JPS62190726A/ja
Publication of JPS62190726A publication Critical patent/JPS62190726A/ja
Publication of JPH0230172B2 publication Critical patent/JPH0230172B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61032379A 1986-02-17 1986-02-17 位置合わせ装置 Granted JPS62190726A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61032379A JPS62190726A (ja) 1986-02-17 1986-02-17 位置合わせ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61032379A JPS62190726A (ja) 1986-02-17 1986-02-17 位置合わせ装置

Publications (2)

Publication Number Publication Date
JPS62190726A JPS62190726A (ja) 1987-08-20
JPH0230172B2 true JPH0230172B2 (enExample) 1990-07-04

Family

ID=12357317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61032379A Granted JPS62190726A (ja) 1986-02-17 1986-02-17 位置合わせ装置

Country Status (1)

Country Link
JP (1) JPS62190726A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69635816T2 (de) 1995-03-28 2006-10-12 Applied Materials, Inc., Santa Clara Verfahren zum Herstellen einer Vorrichtung zur In-Situ-Kontrolle und Bestimmung des Endes von chemisch-mechanischen Planiervorgängen
US5893796A (en) 1995-03-28 1999-04-13 Applied Materials, Inc. Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
US7264536B2 (en) 2003-09-23 2007-09-04 Applied Materials, Inc. Polishing pad with window

Also Published As

Publication number Publication date
JPS62190726A (ja) 1987-08-20

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