DE69228338T2 - Ausrichtvorrichtung - Google Patents

Ausrichtvorrichtung

Info

Publication number
DE69228338T2
DE69228338T2 DE69228338T DE69228338T DE69228338T2 DE 69228338 T2 DE69228338 T2 DE 69228338T2 DE 69228338 T DE69228338 T DE 69228338T DE 69228338 T DE69228338 T DE 69228338T DE 69228338 T2 DE69228338 T2 DE 69228338T2
Authority
DE
Germany
Prior art keywords
alignment device
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69228338T
Other languages
English (en)
Other versions
DE69228338D1 (de
Inventor
Hideo Mizutani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE69228338D1 publication Critical patent/DE69228338D1/de
Application granted granted Critical
Publication of DE69228338T2 publication Critical patent/DE69228338T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69228338T 1991-05-31 1992-05-29 Ausrichtvorrichtung Expired - Fee Related DE69228338T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12956391 1991-05-31

Publications (2)

Publication Number Publication Date
DE69228338D1 DE69228338D1 (de) 1999-03-18
DE69228338T2 true DE69228338T2 (de) 1999-08-26

Family

ID=15012586

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69228338T Expired - Fee Related DE69228338T2 (de) 1991-05-31 1992-05-29 Ausrichtvorrichtung

Country Status (3)

Country Link
US (1) US5204535A (de)
EP (1) EP0520625B1 (de)
DE (1) DE69228338T2 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5488230A (en) * 1992-07-15 1996-01-30 Nikon Corporation Double-beam light source apparatus, position detecting apparatus and aligning apparatus
JPH06177012A (ja) * 1992-12-03 1994-06-24 Nikon Corp アライメント装置
JP3198310B2 (ja) * 1993-01-06 2001-08-13 株式会社ニコン 露光方法及び装置
US6153886A (en) * 1993-02-19 2000-11-28 Nikon Corporation Alignment apparatus in projection exposure apparatus
US5461237A (en) * 1993-03-26 1995-10-24 Nikon Corporation Surface-position setting apparatus
US5583609A (en) * 1993-04-23 1996-12-10 Nikon Corporation Projection exposure apparatus
JP3395280B2 (ja) * 1993-09-21 2003-04-07 株式会社ニコン 投影露光装置及び方法
CA2180941A1 (en) * 1994-01-24 1995-07-27 Gregg M. Gallatin Grating-grating interferometric alignment system
JP3379200B2 (ja) 1994-03-25 2003-02-17 株式会社ニコン 位置検出装置
US5751403A (en) * 1994-06-09 1998-05-12 Nikon Corporation Projection exposure apparatus and method
JPH085314A (ja) * 1994-06-20 1996-01-12 Canon Inc 変位測定方法及び変位測定装置
JPH08186069A (ja) * 1994-12-28 1996-07-16 Nikon Corp 露光装置
US6169602B1 (en) 1995-02-12 2001-01-02 Nikon Corporation Inspection method and apparatus for projection optical systems
US6151122A (en) 1995-02-21 2000-11-21 Nikon Corporation Inspection method and apparatus for projection optical systems
JP3613291B2 (ja) * 1995-03-08 2005-01-26 株式会社ニコン 露光装置
JPH08250391A (ja) * 1995-03-10 1996-09-27 Nikon Corp 位置検出用マーク及び位置検出方法
JP3517504B2 (ja) * 1995-12-15 2004-04-12 キヤノン株式会社 位置検出装置及びそれを用いたデバイスの製造方法
US6718227B1 (en) * 1999-12-16 2004-04-06 Texas Instruments Incorporated System and method for determining a position error in a wafer handling device
US7269191B2 (en) * 2002-02-12 2007-09-11 Finisar Corporation Control circuit for optoelectronic module with integrated temperature control
US6906785B2 (en) 2002-04-23 2005-06-14 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6987555B2 (en) * 2002-04-23 2006-01-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7035300B2 (en) * 2002-11-05 2006-04-25 Finisar Corporation Calibration of a multi-channel optoelectronic module with integrated temperature control
US7058099B2 (en) * 2002-11-08 2006-06-06 Finisar Corporation Age compensation in optoelectronic modules with integrated temperature control
US7236507B2 (en) * 2002-11-08 2007-06-26 Finisar Corporation Time-based adjustment of temperature control of laser to stabilize wavelengths
US7130020B2 (en) * 2003-04-30 2006-10-31 Whitney Theodore R Roll printer with decomposed raster scan and X-Y distortion correction
US7656529B1 (en) * 2006-05-30 2010-02-02 Mehrdad Nikoonahad Overlay error measurement using fourier optics
JP5132401B2 (ja) * 2008-04-16 2013-01-30 キヤノン株式会社 画像処理装置及び画像処理方法
WO2014053334A1 (en) 2012-10-02 2014-04-10 Asml Netherlands B.V. Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method
DE102013021513B4 (de) * 2013-12-18 2017-07-13 Jenoptik Optical Systems Gmbh Optisches Modul zur Optimierung einer Intensitätsverteilung von Strahlung einer ersten Wellenlänge und zum Transmittieren von Strahlung einer zweiten Wellenlänge
WO2020043582A1 (en) 2018-08-29 2020-03-05 Asml Holding N.V. Compact alignment sensor arrangements

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3865483A (en) * 1974-03-21 1975-02-11 Ibm Alignment illumination system
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
DE3682675D1 (de) * 1986-04-29 1992-01-09 Ibm Deutschland Interferometrische maskensubstratausrichtung.
JP2658051B2 (ja) * 1987-05-15 1997-09-30 株式会社ニコン 位置合わせ装置，該装置を用いた投影露光装置及び投影露光方法
NL8900991A (nl) * 1989-04-20 1990-11-16 Asm Lithography Bv Apparaat voor het afbeelden van een maskerpatroon op een substraat.

Also Published As

Publication number Publication date
EP0520625A1 (de) 1992-12-30
EP0520625B1 (de) 1999-02-03
US5204535A (en) 1993-04-20
DE69228338D1 (de) 1999-03-18

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee