JPS62190724A - 位置合せ方法 - Google Patents

位置合せ方法

Info

Publication number
JPS62190724A
JPS62190724A JP61032377A JP3237786A JPS62190724A JP S62190724 A JPS62190724 A JP S62190724A JP 61032377 A JP61032377 A JP 61032377A JP 3237786 A JP3237786 A JP 3237786A JP S62190724 A JPS62190724 A JP S62190724A
Authority
JP
Japan
Prior art keywords
light
pattern
incident
wafer
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61032377A
Other languages
English (en)
Japanese (ja)
Other versions
JPH033377B2 (enExample
Inventor
Hiroshi Uehara
洋 上原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP61032377A priority Critical patent/JPS62190724A/ja
Publication of JPS62190724A publication Critical patent/JPS62190724A/ja
Publication of JPH033377B2 publication Critical patent/JPH033377B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61032377A 1986-02-17 1986-02-17 位置合せ方法 Granted JPS62190724A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61032377A JPS62190724A (ja) 1986-02-17 1986-02-17 位置合せ方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61032377A JPS62190724A (ja) 1986-02-17 1986-02-17 位置合せ方法

Publications (2)

Publication Number Publication Date
JPS62190724A true JPS62190724A (ja) 1987-08-20
JPH033377B2 JPH033377B2 (enExample) 1991-01-18

Family

ID=12357260

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61032377A Granted JPS62190724A (ja) 1986-02-17 1986-02-17 位置合せ方法

Country Status (1)

Country Link
JP (1) JPS62190724A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6950188B2 (en) 2003-04-23 2005-09-27 International Business Machines Corporation Wafer alignment system using parallel imaging detection

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011507835A (ja) 2007-12-21 2011-03-10 アンドレイ・アレクサンドロビッチ・イワシェンコ α−アドレナリン受容体、ドーパミン、ヒスタミン、イミダゾリン及びセロトニン受容体のリガンド並びにその使用

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122128A (en) * 1980-02-29 1981-09-25 Telmec Co Ltd Positioning system for printing device of semiconductor or the like
JPS609126A (ja) * 1983-06-29 1985-01-18 Hitachi Ltd 縮小投影式アライメント方法およびその装置
JPS60119722A (ja) * 1983-12-01 1985-06-27 Hitachi Ltd 半導体露光装置用ウエハパタ−ン検出方法及びその装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122128A (en) * 1980-02-29 1981-09-25 Telmec Co Ltd Positioning system for printing device of semiconductor or the like
JPS609126A (ja) * 1983-06-29 1985-01-18 Hitachi Ltd 縮小投影式アライメント方法およびその装置
JPS60119722A (ja) * 1983-12-01 1985-06-27 Hitachi Ltd 半導体露光装置用ウエハパタ−ン検出方法及びその装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6950188B2 (en) 2003-04-23 2005-09-27 International Business Machines Corporation Wafer alignment system using parallel imaging detection

Also Published As

Publication number Publication date
JPH033377B2 (enExample) 1991-01-18

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