JPS62188319A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS62188319A JPS62188319A JP61031190A JP3119086A JPS62188319A JP S62188319 A JPS62188319 A JP S62188319A JP 61031190 A JP61031190 A JP 61031190A JP 3119086 A JP3119086 A JP 3119086A JP S62188319 A JPS62188319 A JP S62188319A
- Authority
- JP
- Japan
- Prior art keywords
- silicon substrate
- back surface
- alignment marks
- alignment mark
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61031190A JPS62188319A (ja) | 1986-02-14 | 1986-02-14 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61031190A JPS62188319A (ja) | 1986-02-14 | 1986-02-14 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62188319A true JPS62188319A (ja) | 1987-08-17 |
JPH0515051B2 JPH0515051B2 (enrdf_load_stackoverflow) | 1993-02-26 |
Family
ID=12324510
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61031190A Granted JPS62188319A (ja) | 1986-02-14 | 1986-02-14 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62188319A (enrdf_load_stackoverflow) |
-
1986
- 1986-02-14 JP JP61031190A patent/JPS62188319A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0515051B2 (enrdf_load_stackoverflow) | 1993-02-26 |
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