JPS6218561A - 凹凸面形成方法 - Google Patents

凹凸面形成方法

Info

Publication number
JPS6218561A
JPS6218561A JP60158744A JP15874485A JPS6218561A JP S6218561 A JPS6218561 A JP S6218561A JP 60158744 A JP60158744 A JP 60158744A JP 15874485 A JP15874485 A JP 15874485A JP S6218561 A JPS6218561 A JP S6218561A
Authority
JP
Japan
Prior art keywords
mask
film
forming
uneven surface
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60158744A
Other languages
English (en)
Japanese (ja)
Other versions
JPH052142B2 (enrdf_load_stackoverflow
Inventor
Masataka Shirasaki
白崎　正孝
Hiroki Nakajima
啓幾 中島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP60158744A priority Critical patent/JPS6218561A/ja
Priority to CA000504383A priority patent/CA1270934A/en
Priority to EP86400592A priority patent/EP0195724B1/en
Priority to US06/841,801 priority patent/US4806442A/en
Priority to DE8686400592T priority patent/DE3687845T2/de
Publication of JPS6218561A publication Critical patent/JPS6218561A/ja
Publication of JPH052142B2 publication Critical patent/JPH052142B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Integrated Circuits (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP60158744A 1985-03-20 1985-07-17 凹凸面形成方法 Granted JPS6218561A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP60158744A JPS6218561A (ja) 1985-07-17 1985-07-17 凹凸面形成方法
CA000504383A CA1270934A (en) 1985-03-20 1986-03-18 Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings
EP86400592A EP0195724B1 (en) 1985-03-20 1986-03-20 Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings
US06/841,801 US4806442A (en) 1985-03-20 1986-03-20 Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings
DE8686400592T DE3687845T2 (de) 1985-03-20 1986-03-20 Raeumliche phasenmodulationsmasken, verfahren zu deren herstellung und verfahren zur bildung von phasenverschobenen beugungsgittern.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60158744A JPS6218561A (ja) 1985-07-17 1985-07-17 凹凸面形成方法

Publications (2)

Publication Number Publication Date
JPS6218561A true JPS6218561A (ja) 1987-01-27
JPH052142B2 JPH052142B2 (enrdf_load_stackoverflow) 1993-01-11

Family

ID=15678386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60158744A Granted JPS6218561A (ja) 1985-03-20 1985-07-17 凹凸面形成方法

Country Status (1)

Country Link
JP (1) JPS6218561A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63287801A (ja) * 1987-05-08 1988-11-24 財團法人韓國電子通信研究所 回折格子の形状形成方法
JPS642008A (en) * 1987-06-24 1989-01-06 Mitsubishi Electric Corp Formation of diffraction grating

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63287801A (ja) * 1987-05-08 1988-11-24 財團法人韓國電子通信研究所 回折格子の形状形成方法
JPS642008A (en) * 1987-06-24 1989-01-06 Mitsubishi Electric Corp Formation of diffraction grating

Also Published As

Publication number Publication date
JPH052142B2 (enrdf_load_stackoverflow) 1993-01-11

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term