JPS62183885A - 回転塗布方法 - Google Patents

回転塗布方法

Info

Publication number
JPS62183885A
JPS62183885A JP30135886A JP30135886A JPS62183885A JP S62183885 A JPS62183885 A JP S62183885A JP 30135886 A JP30135886 A JP 30135886A JP 30135886 A JP30135886 A JP 30135886A JP S62183885 A JPS62183885 A JP S62183885A
Authority
JP
Japan
Prior art keywords
coated
speed
coating
outer peripheral
peripheral edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30135886A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0426912B2 (enExample
Inventor
Keiichi Shibata
圭一 柴田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP30135886A priority Critical patent/JPS62183885A/ja
Publication of JPS62183885A publication Critical patent/JPS62183885A/ja
Publication of JPH0426912B2 publication Critical patent/JPH0426912B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/162Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
JP30135886A 1986-12-19 1986-12-19 回転塗布方法 Granted JPS62183885A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30135886A JPS62183885A (ja) 1986-12-19 1986-12-19 回転塗布方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30135886A JPS62183885A (ja) 1986-12-19 1986-12-19 回転塗布方法

Publications (2)

Publication Number Publication Date
JPS62183885A true JPS62183885A (ja) 1987-08-12
JPH0426912B2 JPH0426912B2 (enExample) 1992-05-08

Family

ID=17895906

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30135886A Granted JPS62183885A (ja) 1986-12-19 1986-12-19 回転塗布方法

Country Status (1)

Country Link
JP (1) JPS62183885A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03176933A (ja) * 1989-12-05 1991-07-31 Asahi Glass Co Ltd ブラウン管用パネルフェースの表面処理方法及びその装置
JP2008016708A (ja) * 2006-07-07 2008-01-24 Victor Co Of Japan Ltd 処理液塗布装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS551145A (en) * 1978-06-19 1980-01-07 Nec Corp Semiconductor wafer photo-resist applicator
JPS581144A (ja) * 1981-06-25 1983-01-06 Fujitsu Ltd フオトレジストの塗布方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS551145A (en) * 1978-06-19 1980-01-07 Nec Corp Semiconductor wafer photo-resist applicator
JPS581144A (ja) * 1981-06-25 1983-01-06 Fujitsu Ltd フオトレジストの塗布方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03176933A (ja) * 1989-12-05 1991-07-31 Asahi Glass Co Ltd ブラウン管用パネルフェースの表面処理方法及びその装置
JP2008016708A (ja) * 2006-07-07 2008-01-24 Victor Co Of Japan Ltd 処理液塗布装置

Also Published As

Publication number Publication date
JPH0426912B2 (enExample) 1992-05-08

Similar Documents

Publication Publication Date Title
JPH08242840A (ja) 波動形に旋回揺動する振盪機
US20010010305A1 (en) Precision polishing method and apparatus of substrate
KR20160125429A (ko) 스핀 코팅 프로세스에서 결함 제어를 위한 덮개 플레이트
JPS62183885A (ja) 回転塗布方法
KR100280231B1 (ko) 원판형 기록매체에 라커 피복을 적용하는 장치
IL40969A (en) Methods of seed treatment and apparatus therefor
US2446476A (en) Apparatus for coating cylindrical surfaces
US4048951A (en) Apparatus for applying a glass frit to a seal edge of a funnel portion of a picture tube
JPH11121420A (ja) 基板洗浄方法及びその装置
US4069354A (en) Method for dispensing cement onto the seal land of a color crt funnel
US4628984A (en) Method and apparatus for applying a layer of material to a centrifugal casting mold
US1751766A (en) Casting machine
JPS59232417A (ja) 半導体ウエ−ハのレジスト現像装置
JP3156144B2 (ja) 攪拌混合造粒装置
CN112857962B (zh) 一种针对高粘高弹沥青的旋转薄膜烘箱
CN218516595U (zh) 一种棉浆粕生产用均浆装置
JPH03178122A (ja) ホトレジスト塗布装置
JPH03176933A (ja) ブラウン管用パネルフェースの表面処理方法及びその装置
US4020195A (en) Method for enamelling the edges of sanitary articles
JPH04308083A (ja) 薄膜の作成方法
JPS5982968A (ja) ラツカ−スプレ−装置
JPH02307566A (ja) 塗布装置
CN115502048A (zh) 改善匀胶趋势和均匀性的光刻胶匀胶装置、方法及应用
JPH08321456A (ja) 基板処理装置
JP3636627B2 (ja) 板状体表面膜形成装置、方法及びこれらを用いて形成された表面膜を有する板状体