JPH0426912B2 - - Google Patents

Info

Publication number
JPH0426912B2
JPH0426912B2 JP61301358A JP30135886A JPH0426912B2 JP H0426912 B2 JPH0426912 B2 JP H0426912B2 JP 61301358 A JP61301358 A JP 61301358A JP 30135886 A JP30135886 A JP 30135886A JP H0426912 B2 JPH0426912 B2 JP H0426912B2
Authority
JP
Japan
Prior art keywords
coating
coating liquid
speed
original plate
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61301358A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62183885A (ja
Inventor
Keiichi Shibata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP30135886A priority Critical patent/JPS62183885A/ja
Publication of JPS62183885A publication Critical patent/JPS62183885A/ja
Publication of JPH0426912B2 publication Critical patent/JPH0426912B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
JP30135886A 1986-12-19 1986-12-19 回転塗布方法 Granted JPS62183885A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30135886A JPS62183885A (ja) 1986-12-19 1986-12-19 回転塗布方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30135886A JPS62183885A (ja) 1986-12-19 1986-12-19 回転塗布方法

Publications (2)

Publication Number Publication Date
JPS62183885A JPS62183885A (ja) 1987-08-12
JPH0426912B2 true JPH0426912B2 (enExample) 1992-05-08

Family

ID=17895906

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30135886A Granted JPS62183885A (ja) 1986-12-19 1986-12-19 回転塗布方法

Country Status (1)

Country Link
JP (1) JPS62183885A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0675367B2 (ja) * 1989-12-05 1994-09-21 旭硝子株式会社 ブラウン管用パネルフェースの表面処理方法及びその装置
JP2008016708A (ja) * 2006-07-07 2008-01-24 Victor Co Of Japan Ltd 処理液塗布装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS551145A (en) * 1978-06-19 1980-01-07 Nec Corp Semiconductor wafer photo-resist applicator
JPS581144A (ja) * 1981-06-25 1983-01-06 Fujitsu Ltd フオトレジストの塗布方法

Also Published As

Publication number Publication date
JPS62183885A (ja) 1987-08-12

Similar Documents

Publication Publication Date Title
US4222345A (en) Vacuum coating apparatus with rotary motion assembly
JPH0426912B2 (enExample)
JPH06262126A (ja) ディスク状記録キャリアへのラッカー塗布装置
JPH11121420A (ja) 基板洗浄方法及びその装置
JPH11207827A (ja) デジタルビデオディスクに対するプラスチックからなる扁平な円盤形状の基板に同様の第２の基板を接着させるための方法及び該方法を実施するための装置
JPH04369210A (ja) 半導体ウエハ用回転塗布装置
US3793774A (en) Apparatus for grinding inner and outer curved surfaces of a contact lens block simultaneously
JP2983480B2 (ja) スピン処理装置
JPH09199410A (ja) 基板の回転式現像処理方法及び装置
JPS59232417A (ja) 半導体ウエ−ハのレジスト現像装置
JPH0330874A (ja) 平面デイスプレー用ベースプレートの薄層塗布方法および装置
JPH01159080A (ja) 回転塗布装置
JP2866295B2 (ja) 基板への塗布液塗布方法
JP3050630B2 (ja) 塗布装置
JPH0338821A (ja) 塗布方法
JPS581144A (ja) フオトレジストの塗布方法
JPH0620272A (ja) 塗布方法及びその装置
JP3963383B2 (ja) 基板洗浄システムおよび基板洗浄装置
JPH09319094A (ja) スピンナ塗布方法およびスピンナ塗布装置
JPS6231991B2 (enExample)
JPH03178122A (ja) ホトレジスト塗布装置
JPS5982968A (ja) ラツカ−スプレ−装置
JPH0462069B2 (enExample)
JP3064920U (ja) 種子コ―ティング装置
JP2530050Y2 (ja) ローラ外周面の塗布材の塗布方法及び塗布装置