JPS62179120A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS62179120A
JPS62179120A JP1946486A JP1946486A JPS62179120A JP S62179120 A JPS62179120 A JP S62179120A JP 1946486 A JP1946486 A JP 1946486A JP 1946486 A JP1946486 A JP 1946486A JP S62179120 A JPS62179120 A JP S62179120A
Authority
JP
Japan
Prior art keywords
etching
dry etching
contact hole
film
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1946486A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0513376B2 (enExample
Inventor
Yoshitaka Hasegawa
長谷川　義隆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1946486A priority Critical patent/JPS62179120A/ja
Publication of JPS62179120A publication Critical patent/JPS62179120A/ja
Publication of JPH0513376B2 publication Critical patent/JPH0513376B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP1946486A 1986-01-31 1986-01-31 半導体装置の製造方法 Granted JPS62179120A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1946486A JPS62179120A (ja) 1986-01-31 1986-01-31 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1946486A JPS62179120A (ja) 1986-01-31 1986-01-31 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS62179120A true JPS62179120A (ja) 1987-08-06
JPH0513376B2 JPH0513376B2 (enExample) 1993-02-22

Family

ID=12000044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1946486A Granted JPS62179120A (ja) 1986-01-31 1986-01-31 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS62179120A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007067032A (ja) * 2005-08-30 2007-03-15 Oki Electric Ind Co Ltd エッチング方法、金属膜構造体の製造方法およびエッチング構造体
CN104752192A (zh) * 2013-12-31 2015-07-01 中芯国际集成电路制造(上海)有限公司 一种在半导体衬底表面制作斜面的方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007067032A (ja) * 2005-08-30 2007-03-15 Oki Electric Ind Co Ltd エッチング方法、金属膜構造体の製造方法およびエッチング構造体
CN104752192A (zh) * 2013-12-31 2015-07-01 中芯国际集成电路制造(上海)有限公司 一种在半导体衬底表面制作斜面的方法

Also Published As

Publication number Publication date
JPH0513376B2 (enExample) 1993-02-22

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