JPS62178562A - 1,2−キノンジアジド化合物の製造方法 - Google Patents

1,2−キノンジアジド化合物の製造方法

Info

Publication number
JPS62178562A
JPS62178562A JP1689286A JP1689286A JPS62178562A JP S62178562 A JPS62178562 A JP S62178562A JP 1689286 A JP1689286 A JP 1689286A JP 1689286 A JP1689286 A JP 1689286A JP S62178562 A JPS62178562 A JP S62178562A
Authority
JP
Japan
Prior art keywords
agent
compound
acid chloride
acid
quinone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1689286A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0583543B2 (enrdf_load_stackoverflow
Inventor
Yukihiro Hosaka
幸宏 保坂
Ikuo Nozue
野末 幾男
Hitoshi Oka
岡 仁志
Yoshiyuki Harita
榛田 善行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP1689286A priority Critical patent/JPS62178562A/ja
Publication of JPS62178562A publication Critical patent/JPS62178562A/ja
Publication of JPH0583543B2 publication Critical patent/JPH0583543B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Pyrane Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP1689286A 1986-01-30 1986-01-30 1,2−キノンジアジド化合物の製造方法 Granted JPS62178562A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1689286A JPS62178562A (ja) 1986-01-30 1986-01-30 1,2−キノンジアジド化合物の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1689286A JPS62178562A (ja) 1986-01-30 1986-01-30 1,2−キノンジアジド化合物の製造方法

Publications (2)

Publication Number Publication Date
JPS62178562A true JPS62178562A (ja) 1987-08-05
JPH0583543B2 JPH0583543B2 (enrdf_load_stackoverflow) 1993-11-26

Family

ID=11928808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1689286A Granted JPS62178562A (ja) 1986-01-30 1986-01-30 1,2−キノンジアジド化合物の製造方法

Country Status (1)

Country Link
JP (1) JPS62178562A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63110446A (ja) * 1986-10-29 1988-05-14 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH01156738A (ja) * 1987-12-15 1989-06-20 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP0710886A1 (en) 1994-10-31 1996-05-08 Fuji Photo Film Co., Ltd. Positive photoresist composition
JP2018154625A (ja) * 2008-07-21 2018-10-04 ユニゲン・インコーポレーテッド スキンホワイトニング(色を薄くする)化合物系列

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4407926A (en) * 1980-11-21 1983-10-04 Hoechst Aktiengesellschaft Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom
US4409314A (en) * 1980-10-24 1983-10-11 Hoechst Aktiengesellschaft Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom
EP0167778A1 (de) * 1984-06-08 1986-01-15 Hoechst Aktiengesellschaft Perfluoralkylgruppen aufweisende 1,2-Naphthochinondiazidverbindungen und Reproduktionsmaterialien, die diese Verbindungen enthalten

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4409314A (en) * 1980-10-24 1983-10-11 Hoechst Aktiengesellschaft Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom
US4407926A (en) * 1980-11-21 1983-10-04 Hoechst Aktiengesellschaft Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom
EP0167778A1 (de) * 1984-06-08 1986-01-15 Hoechst Aktiengesellschaft Perfluoralkylgruppen aufweisende 1,2-Naphthochinondiazidverbindungen und Reproduktionsmaterialien, die diese Verbindungen enthalten

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63110446A (ja) * 1986-10-29 1988-05-14 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH01156738A (ja) * 1987-12-15 1989-06-20 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP0710886A1 (en) 1994-10-31 1996-05-08 Fuji Photo Film Co., Ltd. Positive photoresist composition
JP2018154625A (ja) * 2008-07-21 2018-10-04 ユニゲン・インコーポレーテッド スキンホワイトニング(色を薄くする)化合物系列

Also Published As

Publication number Publication date
JPH0583543B2 (enrdf_load_stackoverflow) 1993-11-26

Similar Documents

Publication Publication Date Title
JPH0322619B2 (enrdf_load_stackoverflow)
JPS60158440A (ja) ポジ型フオトレジスト組成物
US5753406A (en) Radiation-sensitive resin composition
JPS60189739A (ja) ポジ型感光性樹脂組成物
JPS62153950A (ja) ポジ型感放射線性樹脂組成物
EP0459708A2 (en) Image reversal negative working photoresist
JPH08262712A (ja) 感放射線性樹脂組成物
JPH01177032A (ja) 感放射線性樹脂組成物
JPS62178562A (ja) 1,2−キノンジアジド化合物の製造方法
JP2555589B2 (ja) 集積回路作製用ポジ型感放射線性樹脂組成物
JPS632044A (ja) ポジ型感放射線性樹脂組成物
JPS62280737A (ja) 半導体デバイス製造用ポジ型感放射線性樹脂組成物
JPH03128959A (ja) 感放射線性樹脂組成物
CN114137795A (zh) 一种光刻胶组合物及其应用
JPH09311441A (ja) ポジティブ型フォトレジスト組成物
JP3640078B2 (ja) 感放射線性樹脂組成物
JP2743697B2 (ja) ポジ型レジスト組成物
JPH0356960A (ja) ポジ型フオトレジスト組成物
JPS63113451A (ja) ポジ型感放射線性樹脂組成物
JPS60146234A (ja) ポジ型感光性樹脂組成物
JPS63159843A (ja) ポジ型ホトレジスト
JPH0792669A (ja) 感放射線性樹脂組成物
JPH01156738A (ja) 感放射線性樹脂組成物
JP3472994B2 (ja) 感放射線性樹脂組成物
JP2775833B2 (ja) 感放射線性樹脂組成物

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term