JPS62155518A - 軟ｘ線リソグラフイ−用マスク - Google Patents

軟ｘ線リソグラフイ−用マスク

Info

Publication number
JPS62155518A
JPS62155518A JP61191946A JP19194686A JPS62155518A JP S62155518 A JPS62155518 A JP S62155518A JP 61191946 A JP61191946 A JP 61191946A JP 19194686 A JP19194686 A JP 19194686A JP S62155518 A JPS62155518 A JP S62155518A
Authority
JP
Japan
Prior art keywords
soft
film
ray
resin film
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61191946A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0441487B2 (enExample
Inventor
Yuji Kikuchi
菊地　勇治
Akira Kaneki
金木　暁
Norihiko Tsukui
津久井　紀彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP52154430A external-priority patent/JPS6045419B2/ja
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP61191946A priority Critical patent/JPS62155518A/ja
Publication of JPS62155518A publication Critical patent/JPS62155518A/ja
Publication of JPH0441487B2 publication Critical patent/JPH0441487B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61191946A 1977-12-23 1986-08-15 軟ｘ線リソグラフイ−用マスク Granted JPS62155518A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61191946A JPS62155518A (ja) 1977-12-23 1986-08-15 軟ｘ線リソグラフイ−用マスク

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP52154430A JPS6045419B2 (ja) 1977-12-23 1977-12-23 軟ｘ線リソグラフイ−用マスクおよびその製造法
JP61191946A JPS62155518A (ja) 1977-12-23 1986-08-15 軟ｘ線リソグラフイ−用マスク

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP52154430A Division JPS6045419B2 (ja) 1977-12-23 1977-12-23 軟ｘ線リソグラフイ−用マスクおよびその製造法

Publications (2)

Publication Number Publication Date
JPS62155518A true JPS62155518A (ja) 1987-07-10
JPH0441487B2 JPH0441487B2 (enExample) 1992-07-08

Family

ID=26482710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61191946A Granted JPS62155518A (ja) 1977-12-23 1986-08-15 軟ｘ線リソグラフイ−用マスク

Country Status (1)

Country Link
JP (1) JPS62155518A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021077775A (ja) * 2019-11-11 2021-05-20 住重アテックス株式会社 マスクホルダ、固定装置、イオン照射方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4979176A (enExample) * 1972-12-04 1974-07-31
JPS5057778A (enExample) * 1973-09-17 1975-05-20
JPS5279069U (enExample) * 1975-12-09 1977-06-13
JPS52139375A (en) * 1976-05-18 1977-11-21 Toshiba Corp Mask for x-ray exposure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4979176A (enExample) * 1972-12-04 1974-07-31
JPS5057778A (enExample) * 1973-09-17 1975-05-20
JPS5279069U (enExample) * 1975-12-09 1977-06-13
JPS52139375A (en) * 1976-05-18 1977-11-21 Toshiba Corp Mask for x-ray exposure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021077775A (ja) * 2019-11-11 2021-05-20 住重アテックス株式会社 マスクホルダ、固定装置、イオン照射方法

Also Published As

Publication number Publication date
JPH0441487B2 (enExample) 1992-07-08

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