JPS621535B2 - - Google Patents

Info

Publication number
JPS621535B2
JPS621535B2 JP57229370A JP22937082A JPS621535B2 JP S621535 B2 JPS621535 B2 JP S621535B2 JP 57229370 A JP57229370 A JP 57229370A JP 22937082 A JP22937082 A JP 22937082A JP S621535 B2 JPS621535 B2 JP S621535B2
Authority
JP
Japan
Prior art keywords
electrode
discharge
plasma
substrate
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57229370A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59120240A (ja
Inventor
Shunpei Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP57229370A priority Critical patent/JPS59120240A/ja
Publication of JPS59120240A publication Critical patent/JPS59120240A/ja
Publication of JPS621535B2 publication Critical patent/JPS621535B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Recrystallisation Techniques (AREA)
JP57229370A 1982-12-27 1982-12-27 プラズマ気相反応装置 Granted JPS59120240A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57229370A JPS59120240A (ja) 1982-12-27 1982-12-27 プラズマ気相反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57229370A JPS59120240A (ja) 1982-12-27 1982-12-27 プラズマ気相反応装置

Publications (2)

Publication Number Publication Date
JPS59120240A JPS59120240A (ja) 1984-07-11
JPS621535B2 true JPS621535B2 (enExample) 1987-01-14

Family

ID=16891102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57229370A Granted JPS59120240A (ja) 1982-12-27 1982-12-27 プラズマ気相反応装置

Country Status (1)

Country Link
JP (1) JPS59120240A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2752235B2 (ja) * 1990-06-26 1998-05-18 株式会社東芝 半導体基板の製造方法

Also Published As

Publication number Publication date
JPS59120240A (ja) 1984-07-11

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