JPS6215241Y2 - - Google Patents

Info

Publication number
JPS6215241Y2
JPS6215241Y2 JP10757681U JP10757681U JPS6215241Y2 JP S6215241 Y2 JPS6215241 Y2 JP S6215241Y2 JP 10757681 U JP10757681 U JP 10757681U JP 10757681 U JP10757681 U JP 10757681U JP S6215241 Y2 JPS6215241 Y2 JP S6215241Y2
Authority
JP
Japan
Prior art keywords
etching
partition plate
tube
inner tube
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10757681U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5815656U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10757681U priority Critical patent/JPS5815656U/ja
Publication of JPS5815656U publication Critical patent/JPS5815656U/ja
Application granted granted Critical
Publication of JPS6215241Y2 publication Critical patent/JPS6215241Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
JP10757681U 1981-07-20 1981-07-20 エツチング装置 Granted JPS5815656U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10757681U JPS5815656U (ja) 1981-07-20 1981-07-20 エツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10757681U JPS5815656U (ja) 1981-07-20 1981-07-20 エツチング装置

Publications (2)

Publication Number Publication Date
JPS5815656U JPS5815656U (ja) 1983-01-31
JPS6215241Y2 true JPS6215241Y2 (enrdf_load_stackoverflow) 1987-04-17

Family

ID=29902006

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10757681U Granted JPS5815656U (ja) 1981-07-20 1981-07-20 エツチング装置

Country Status (1)

Country Link
JP (1) JPS5815656U (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5815656U (ja) 1983-01-31

Similar Documents

Publication Publication Date Title
EP0481506B1 (en) Method of treating substrate and apparatus for the same
EP0134438A2 (en) Vacuum and/or electrostatic pinchuck for holding semiconductor wafers or other flat electrical components and method for making the same
JP2004095712A (ja) 現像方法、基板処理方法、及び基板処理装置
KR100373774B1 (ko) 스테이지로부터 미세 먼지를 제거하는 방법 및 클리닝 판
US6376390B1 (en) Methods and apparatuses for removing material from discrete areas on a semiconductor wafer
TWI411033B (zh) 粘接之矽電極的清理
CN116544300A (zh) 一种InAs/GaSb II类超晶格红外探测器的制备方法
JPS6215241Y2 (enrdf_load_stackoverflow)
JPS58130529A (ja) 半導体のエツチング方法
JPH10128633A (ja) 真空吸着装置
JPH07240360A (ja) 薬液塗布装置
TW473780B (en) Post-plasma processing wafer cleaning method and system
JPS6350854B2 (enrdf_load_stackoverflow)
JP2008244323A (ja) ステンシルマスク
JP2579920B2 (ja) 基板処理方法
CN104407503B (zh) 曝光方法和半导体器件的制造方法
JPH06224171A (ja) ウエハ洗浄方法および装置
JPS5947735A (ja) ガラス被覆半導体装置用不要ガラス除去装置
JPH01107545A (ja) シリコン薄膜のエッチング方法
KR910006042B1 (ko) 반도체장치의 사진공정
JPS643337B2 (enrdf_load_stackoverflow)
KR100661721B1 (ko) 반도체 소자 제조 방법
JPS59119727A (ja) ドライエツチング方法
JPH09291380A (ja) エッチング用基板へのフォトレジスト膜パターン形成方法
JPS62276831A (ja) 半導体ウエハ−のウエツト処理方法