JPS6350854B2 - - Google Patents

Info

Publication number
JPS6350854B2
JPS6350854B2 JP53076986A JP7698678A JPS6350854B2 JP S6350854 B2 JPS6350854 B2 JP S6350854B2 JP 53076986 A JP53076986 A JP 53076986A JP 7698678 A JP7698678 A JP 7698678A JP S6350854 B2 JPS6350854 B2 JP S6350854B2
Authority
JP
Japan
Prior art keywords
etching
dry etching
substrate
etched
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53076986A
Other languages
English (en)
Japanese (ja)
Other versions
JPS554937A (en
Inventor
Hiroshi Yano
Tetsuya Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7698678A priority Critical patent/JPS554937A/ja
Publication of JPS554937A publication Critical patent/JPS554937A/ja
Publication of JPS6350854B2 publication Critical patent/JPS6350854B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP7698678A 1978-06-27 1978-06-27 Dry etching method Granted JPS554937A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7698678A JPS554937A (en) 1978-06-27 1978-06-27 Dry etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7698678A JPS554937A (en) 1978-06-27 1978-06-27 Dry etching method

Publications (2)

Publication Number Publication Date
JPS554937A JPS554937A (en) 1980-01-14
JPS6350854B2 true JPS6350854B2 (enrdf_load_stackoverflow) 1988-10-12

Family

ID=13621090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7698678A Granted JPS554937A (en) 1978-06-27 1978-06-27 Dry etching method

Country Status (1)

Country Link
JP (1) JPS554937A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56105483A (en) * 1980-01-25 1981-08-21 Mitsubishi Electric Corp Dry etching device
JPS6084762U (ja) * 1983-11-15 1985-06-11 愛三工業株式会社 内燃機関用混合気供給装置
JPS62279626A (ja) * 1986-05-27 1987-12-04 M Setetsuku Kk 半導体用基板に対する不純物のド−ピング方法
US5085727A (en) * 1990-05-21 1992-02-04 Applied Materials, Inc. Plasma etch apparatus with conductive coating on inner metal surfaces of chamber to provide protection from chemical corrosion
DE102006042501B4 (de) * 2006-09-07 2010-11-25 Eisenmann Anlagenbau Gmbh & Co. Kg Verfahren und Anlage zum Trocknen von Gegenständen

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52130288A (en) * 1976-04-26 1977-11-01 Hitachi Ltd Patterning method

Also Published As

Publication number Publication date
JPS554937A (en) 1980-01-14

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