JPS6214936B2 - - Google Patents

Info

Publication number
JPS6214936B2
JPS6214936B2 JP52135091A JP13509177A JPS6214936B2 JP S6214936 B2 JPS6214936 B2 JP S6214936B2 JP 52135091 A JP52135091 A JP 52135091A JP 13509177 A JP13509177 A JP 13509177A JP S6214936 B2 JPS6214936 B2 JP S6214936B2
Authority
JP
Japan
Prior art keywords
plasma
predetermined
pressure
gas
active gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52135091A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5477573A (en
Inventor
Tadayoshi Mifune
Yasuaki Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP13509177A priority Critical patent/JPS5477573A/ja
Publication of JPS5477573A publication Critical patent/JPS5477573A/ja
Publication of JPS6214936B2 publication Critical patent/JPS6214936B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP13509177A 1977-11-10 1977-11-10 Operating method of plasma treating apparatus Granted JPS5477573A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13509177A JPS5477573A (en) 1977-11-10 1977-11-10 Operating method of plasma treating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13509177A JPS5477573A (en) 1977-11-10 1977-11-10 Operating method of plasma treating apparatus

Publications (2)

Publication Number Publication Date
JPS5477573A JPS5477573A (en) 1979-06-21
JPS6214936B2 true JPS6214936B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-04-04

Family

ID=15143617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13509177A Granted JPS5477573A (en) 1977-11-10 1977-11-10 Operating method of plasma treating apparatus

Country Status (1)

Country Link
JP (1) JPS5477573A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5944770B2 (ja) * 1980-07-25 1984-11-01 三菱電機株式会社 プラズマｃｖｄ用反応器の洗浄方法
JPS63129630A (ja) * 1986-11-20 1988-06-02 Fuji Electric Co Ltd プラズマｃｖｄ薄膜形成法
JP2662688B2 (ja) * 1987-10-16 1997-10-15 株式会社 半導体エネルギー研究所 被膜作製方法
JP5082288B2 (ja) * 2006-04-26 2012-11-28 パナソニック株式会社 プラズマ処理装置およびプラズマ処理方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117071A (en) * 1976-03-29 1977-10-01 Hitachi Ltd Self-cleaning type preparation of semiconductor

Also Published As

Publication number Publication date
JPS5477573A (en) 1979-06-21

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