JPS6214935B2 - - Google Patents

Info

Publication number
JPS6214935B2
JPS6214935B2 JP54129985A JP12998579A JPS6214935B2 JP S6214935 B2 JPS6214935 B2 JP S6214935B2 JP 54129985 A JP54129985 A JP 54129985A JP 12998579 A JP12998579 A JP 12998579A JP S6214935 B2 JPS6214935 B2 JP S6214935B2
Authority
JP
Japan
Prior art keywords
wafer
pattern
mask
component
top surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54129985A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5655041A (en
Inventor
Sunao Ishihara
Eitaro Kawaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP12998579A priority Critical patent/JPS5655041A/ja
Publication of JPS5655041A publication Critical patent/JPS5655041A/ja
Publication of JPS6214935B2 publication Critical patent/JPS6214935B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12998579A 1979-10-11 1979-10-11 Positioning exposure Granted JPS5655041A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12998579A JPS5655041A (en) 1979-10-11 1979-10-11 Positioning exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12998579A JPS5655041A (en) 1979-10-11 1979-10-11 Positioning exposure

Publications (2)

Publication Number Publication Date
JPS5655041A JPS5655041A (en) 1981-05-15
JPS6214935B2 true JPS6214935B2 (enrdf_load_stackoverflow) 1987-04-04

Family

ID=15023299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12998579A Granted JPS5655041A (en) 1979-10-11 1979-10-11 Positioning exposure

Country Status (1)

Country Link
JP (1) JPS5655041A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2538923A1 (fr) * 1982-12-30 1984-07-06 Thomson Csf Procede et dispositif d'alignement optique de motifs dans deux plans rapproches dans un appareil d'exposition comprenant une source de rayonnement divergent
JP2644692B2 (ja) * 1995-01-30 1997-08-25 キヤノン株式会社 Ｘ線転写装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51140488A (en) * 1975-05-30 1976-12-03 Hitachi Ltd Mask alignment device
JPS524177A (en) * 1975-06-27 1977-01-13 Toshiba Corp Automatic mask aligning method
DE2635275C2 (de) * 1976-08-05 1984-09-06 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Justierung eines scheibenförmigen Substrates relativ zu einer Fotomaske in einem Röntgenstrahlbelichtungsgerät
BE846198A (fr) * 1976-09-15 1977-03-15 Arme de chasse perfectionnee

Also Published As

Publication number Publication date
JPS5655041A (en) 1981-05-15

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