JPS621472B2 - - Google Patents
Info
- Publication number
- JPS621472B2 JPS621472B2 JP2846883A JP2846883A JPS621472B2 JP S621472 B2 JPS621472 B2 JP S621472B2 JP 2846883 A JP2846883 A JP 2846883A JP 2846883 A JP2846883 A JP 2846883A JP S621472 B2 JPS621472 B2 JP S621472B2
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- section
- sputtering
- loading
- shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 claims description 33
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 11
- 238000009434 installation Methods 0.000 description 6
- 210000000078 claw Anatomy 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2846883A JPS59157281A (ja) | 1983-02-24 | 1983-02-24 | スパツタリング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2846883A JPS59157281A (ja) | 1983-02-24 | 1983-02-24 | スパツタリング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59157281A JPS59157281A (ja) | 1984-09-06 |
| JPS621472B2 true JPS621472B2 (zh) | 1987-01-13 |
Family
ID=12249480
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2846883A Granted JPS59157281A (ja) | 1983-02-24 | 1983-02-24 | スパツタリング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59157281A (zh) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5021138A (en) * | 1985-01-17 | 1991-06-04 | Babu Suryadevara V | Side source center sink plasma reactor |
| JPS61168922A (ja) * | 1985-01-17 | 1986-07-30 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | プラズマ・エツチング装置 |
| FR2594102B1 (fr) * | 1986-02-12 | 1991-04-19 | Stein Heurtey | Installation flexible automatisee de traitement thermochimique rapide |
| US6413381B1 (en) * | 2000-04-12 | 2002-07-02 | Steag Hamatech Ag | Horizontal sputtering system |
| DE102008062332A1 (de) * | 2008-12-15 | 2010-06-17 | Gühring Ohg | Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten |
| JP7000083B2 (ja) * | 2017-09-07 | 2022-01-19 | 芝浦メカトロニクス株式会社 | 成膜装置 |
-
1983
- 1983-02-24 JP JP2846883A patent/JPS59157281A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59157281A (ja) | 1984-09-06 |
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