JPS6214146A - 放射線感応性レジスト材料およびそれを用いる微細加工方法 - Google Patents

放射線感応性レジスト材料およびそれを用いる微細加工方法

Info

Publication number
JPS6214146A
JPS6214146A JP60152306A JP15230685A JPS6214146A JP S6214146 A JPS6214146 A JP S6214146A JP 60152306 A JP60152306 A JP 60152306A JP 15230685 A JP15230685 A JP 15230685A JP S6214146 A JPS6214146 A JP S6214146A
Authority
JP
Japan
Prior art keywords
radiation
methylstyrene
alpha
polymer
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60152306A
Other languages
English (en)
Japanese (ja)
Other versions
JPH052141B2 (ko
Inventor
Tsugio Yamaoka
亜夫 山岡
Sanjiyu Fukuda
三寿 福田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Toyo Soda Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Soda Manufacturing Co Ltd filed Critical Toyo Soda Manufacturing Co Ltd
Priority to JP60152306A priority Critical patent/JPS6214146A/ja
Publication of JPS6214146A publication Critical patent/JPS6214146A/ja
Publication of JPH052141B2 publication Critical patent/JPH052141B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60152306A 1985-07-12 1985-07-12 放射線感応性レジスト材料およびそれを用いる微細加工方法 Granted JPS6214146A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60152306A JPS6214146A (ja) 1985-07-12 1985-07-12 放射線感応性レジスト材料およびそれを用いる微細加工方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60152306A JPS6214146A (ja) 1985-07-12 1985-07-12 放射線感応性レジスト材料およびそれを用いる微細加工方法

Publications (2)

Publication Number Publication Date
JPS6214146A true JPS6214146A (ja) 1987-01-22
JPH052141B2 JPH052141B2 (ko) 1993-01-11

Family

ID=15537641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60152306A Granted JPS6214146A (ja) 1985-07-12 1985-07-12 放射線感応性レジスト材料およびそれを用いる微細加工方法

Country Status (1)

Country Link
JP (1) JPS6214146A (ko)

Also Published As

Publication number Publication date
JPH052141B2 (ko) 1993-01-11

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