JPS62134924A - 基板加熱ホルダ - Google Patents

基板加熱ホルダ

Info

Publication number
JPS62134924A
JPS62134924A JP27521085A JP27521085A JPS62134924A JP S62134924 A JPS62134924 A JP S62134924A JP 27521085 A JP27521085 A JP 27521085A JP 27521085 A JP27521085 A JP 27521085A JP S62134924 A JPS62134924 A JP S62134924A
Authority
JP
Japan
Prior art keywords
substrate
pbn
boron nitride
pyrostick
heating holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27521085A
Other languages
English (en)
Japanese (ja)
Other versions
JPH022284B2 (enrdf_load_stackoverflow
Inventor
Junji Saito
淳二 斉藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP27521085A priority Critical patent/JPS62134924A/ja
Publication of JPS62134924A publication Critical patent/JPS62134924A/ja
Publication of JPH022284B2 publication Critical patent/JPH022284B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP27521085A 1985-12-09 1985-12-09 基板加熱ホルダ Granted JPS62134924A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27521085A JPS62134924A (ja) 1985-12-09 1985-12-09 基板加熱ホルダ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27521085A JPS62134924A (ja) 1985-12-09 1985-12-09 基板加熱ホルダ

Publications (2)

Publication Number Publication Date
JPS62134924A true JPS62134924A (ja) 1987-06-18
JPH022284B2 JPH022284B2 (enrdf_load_stackoverflow) 1990-01-17

Family

ID=17552226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27521085A Granted JPS62134924A (ja) 1985-12-09 1985-12-09 基板加熱ホルダ

Country Status (1)

Country Link
JP (1) JPS62134924A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62158193A (ja) * 1985-12-19 1987-07-14 グ−ルド・インコ−ポレイテッド 半導体ウェーハ保持装置
US6159301A (en) * 1997-12-17 2000-12-12 Asm Japan K.K. Substrate holding apparatus for processing semiconductor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62158193A (ja) * 1985-12-19 1987-07-14 グ−ルド・インコ−ポレイテッド 半導体ウェーハ保持装置
US6159301A (en) * 1997-12-17 2000-12-12 Asm Japan K.K. Substrate holding apparatus for processing semiconductor

Also Published As

Publication number Publication date
JPH022284B2 (enrdf_load_stackoverflow) 1990-01-17

Similar Documents

Publication Publication Date Title
WO1996011797A1 (en) Wafer support fixtures for rapid thermal processing
JPH042552B2 (enrdf_load_stackoverflow)
JP3004846B2 (ja) 気相成長装置用サセプタ
JP3911518B2 (ja) 気相成長装置用サセプターと気相成長方法
JPS62134924A (ja) 基板加熱ホルダ
JPH07245264A (ja) 気相成長装置
JPH07249580A (ja) 薄膜製造装置
JP2004059990A (ja) 成膜装置
JPS6358916A (ja) 分子線エピタキシ−装置
JPS60112691A (ja) 分子線エピタキシャル成長装置用の基板保持装置
JPS62279624A (ja) 分子線エピタキシ用基板ホルダ
JP2944426B2 (ja) 分子線エピタキシー装置
JPH09199508A (ja) GaAs基板の熱処理方法及び熱処理用基板ホルダ
CN213061018U (zh) 一种cvd镀膜装置的衬底
JP3907132B2 (ja) ダイヤモンドコーティングが施されたるつぼを用いる蒸着または堆積方法
JPH034024Y2 (enrdf_load_stackoverflow)
JPH0322429A (ja) 化学的気相成長装置
JP3198971B2 (ja) 分子線エピタキシー装置
JPS587818A (ja) シリコン半導体の気相成長方法及び気相成長用スペ−サ
JPH0365590A (ja) 分子線エピタキシー装置
JPH0474794A (ja) 基板ホルダおよび基板の装着方法
JPS62123093A (ja) 分子線エピタキシヤル成長装置の基板装着方法
JPS62196814A (ja) 分子線エピタキシ用基板ホルダ
JP3227626B2 (ja) 半導体基板加熱装置
JPH03271193A (ja) 基板保持具

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term