JPS6212505B2 - - Google Patents

Info

Publication number
JPS6212505B2
JPS6212505B2 JP9662281A JP9662281A JPS6212505B2 JP S6212505 B2 JPS6212505 B2 JP S6212505B2 JP 9662281 A JP9662281 A JP 9662281A JP 9662281 A JP9662281 A JP 9662281A JP S6212505 B2 JPS6212505 B2 JP S6212505B2
Authority
JP
Japan
Prior art keywords
pattern
photomask
photosensitive substrate
composite
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9662281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57212444A (en
Inventor
Isao Kojima
Kunio Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9662281A priority Critical patent/JPS57212444A/ja
Publication of JPS57212444A publication Critical patent/JPS57212444A/ja
Publication of JPS6212505B2 publication Critical patent/JPS6212505B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP9662281A 1981-06-24 1981-06-24 Production of photomask Granted JPS57212444A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9662281A JPS57212444A (en) 1981-06-24 1981-06-24 Production of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9662281A JPS57212444A (en) 1981-06-24 1981-06-24 Production of photomask

Publications (2)

Publication Number Publication Date
JPS57212444A JPS57212444A (en) 1982-12-27
JPS6212505B2 true JPS6212505B2 (enExample) 1987-03-19

Family

ID=14169936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9662281A Granted JPS57212444A (en) 1981-06-24 1981-06-24 Production of photomask

Country Status (1)

Country Link
JP (1) JPS57212444A (enExample)

Also Published As

Publication number Publication date
JPS57212444A (en) 1982-12-27

Similar Documents

Publication Publication Date Title
EP0370935A3 (en) Method of forming conductive lines and studs
US3264105A (en) Method of using a master art drawing to produce a two-sided printed circuit board
US3385702A (en) Photomechanical method of making metallic patterns
JPS6212505B2 (enExample)
JPS59160144A (ja) ホトマスク
GB1145987A (en) Improvements in methods of etching
US3782942A (en) Method for preparing artwork to be used in manufacturing of printed circuits
US3666463A (en) Mask overlay comparison
US6560767B2 (en) Process for making photomask pattern data and photomask
US3674487A (en) Mask overlay checking means
JPH1195405A (ja) フォトマスクの製造方法
US3829213A (en) Artproof method for semiconductor devices
JPS6245026A (ja) 半導体集積回路の写真製版方法
JPS59192248A (ja) レテイクル
US3558312A (en) Process for fabricating multiple image photographic masters
JPH06105678B2 (ja) 半導体装置の製造方法
JP2757409B2 (ja) プリント基板の原画作成方法
JPS6233580B2 (enExample)
JPS6042828A (ja) マスク目合せ方法
US3775118A (en) Photomechanical method of producing grounded printed circuits
KR860002940A (ko) 인쇄 배선판의 제작방법
JP2832787B2 (ja) Ｃａｄシステムによるプリント基板の製造方法及び部品実装方法
JPS60254727A (ja) 半導体装置の製造方法
JPS62125620A (ja) 半導体装置の製造方法
JPS6225782A (ja) 表示用遮光板の製造方法