JPS57212444A - Production of photomask - Google Patents

Production of photomask

Info

Publication number
JPS57212444A
JPS57212444A JP9662281A JP9662281A JPS57212444A JP S57212444 A JPS57212444 A JP S57212444A JP 9662281 A JP9662281 A JP 9662281A JP 9662281 A JP9662281 A JP 9662281A JP S57212444 A JPS57212444 A JP S57212444A
Authority
JP
Japan
Prior art keywords
pattern
photomask
production
base material
latent image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9662281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6212505B2 (enExample
Inventor
Isao Kojima
Kunio Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9662281A priority Critical patent/JPS57212444A/ja
Publication of JPS57212444A publication Critical patent/JPS57212444A/ja
Publication of JPS6212505B2 publication Critical patent/JPS6212505B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP9662281A 1981-06-24 1981-06-24 Production of photomask Granted JPS57212444A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9662281A JPS57212444A (en) 1981-06-24 1981-06-24 Production of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9662281A JPS57212444A (en) 1981-06-24 1981-06-24 Production of photomask

Publications (2)

Publication Number Publication Date
JPS57212444A true JPS57212444A (en) 1982-12-27
JPS6212505B2 JPS6212505B2 (enExample) 1987-03-19

Family

ID=14169936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9662281A Granted JPS57212444A (en) 1981-06-24 1981-06-24 Production of photomask

Country Status (1)

Country Link
JP (1) JPS57212444A (enExample)

Also Published As

Publication number Publication date
JPS6212505B2 (enExample) 1987-03-19

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