JPS57212444A - Production of photomask - Google Patents
Production of photomaskInfo
- Publication number
- JPS57212444A JPS57212444A JP9662281A JP9662281A JPS57212444A JP S57212444 A JPS57212444 A JP S57212444A JP 9662281 A JP9662281 A JP 9662281A JP 9662281 A JP9662281 A JP 9662281A JP S57212444 A JPS57212444 A JP S57212444A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- photomask
- production
- base material
- latent image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To realize high productivity and low cost, by forming a composite pattern of the 1st and 2nd patterns based on only the basic 1st pattern which can be easily produced. CONSTITUTION:A composite pattern of the 1st pattern 1 and the 2nd pattern 2 which encloses the pattern 1 with a space secured between them is formed with use of a photomask. For the production of this photomask, a visible pattern 1A is obtained by enlarging the pattern 1. Then an latent image pattern 2A of the pattern 2 is formed on a mask base material with use of the pattern 1A. Furthermore, a latent image pattern 1B of the pattern 1 is formed, and both patterns 1 and 2 are made visible after giving a development process to the mask base material. In such a way, the production is excluded for the pattern 2 that is hard to produce. As a result, the productivity is increased with a reduction of cost for a photomask.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9662281A JPS57212444A (en) | 1981-06-24 | 1981-06-24 | Production of photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9662281A JPS57212444A (en) | 1981-06-24 | 1981-06-24 | Production of photomask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57212444A true JPS57212444A (en) | 1982-12-27 |
JPS6212505B2 JPS6212505B2 (en) | 1987-03-19 |
Family
ID=14169936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9662281A Granted JPS57212444A (en) | 1981-06-24 | 1981-06-24 | Production of photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57212444A (en) |
-
1981
- 1981-06-24 JP JP9662281A patent/JPS57212444A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6212505B2 (en) | 1987-03-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5391532A (en) | Pattern generating equipment | |
JPS57212444A (en) | Production of photomask | |
JPS5226171A (en) | Mask creation method | |
JPS5394878A (en) | Mask matching key | |
JPS51147413A (en) | A process for producing a filter using copper powder substituted with grinding powder of steel | |
JPS5389673A (en) | Fine pattern forming method of semiconductor device | |
JPS5619051A (en) | Production of photo mask | |
JPS5440602A (en) | Production of stylus | |
JPS57172734A (en) | Exposing process for electronic beam | |
JPS5226924A (en) | Manufacturing method of face boards of binder, file, briefcase, container and the like | |
JPS53112671A (en) | Forming method for pattern | |
JPS5291366A (en) | Production of fluorescent screen | |
JPS5612644A (en) | Manufacture of photomask | |
JPS53141035A (en) | Photoetching method | |
JPS52149982A (en) | Forming method of electrode patterns | |
JPS5370674A (en) | Method of producing photomask | |
JPS5335554A (en) | Image forming device | |
JPS534477A (en) | Production of semiconductor device | |
JPS53104173A (en) | Master reticle for photo mask production | |
JPS51122564A (en) | Sand picture | |
JPS5312651A (en) | Shell working method of wristwatch case | |
JPS5299773A (en) | Forming method for small size regions | |
JPS531126A (en) | Production of c#-w fiber composite material | |
JPS51122562A (en) | Sand picture | |
JPS5223327A (en) | Method for producing image formation material |