JPS6212503B2 - - Google Patents

Info

Publication number
JPS6212503B2
JPS6212503B2 JP6429680A JP6429680A JPS6212503B2 JP S6212503 B2 JPS6212503 B2 JP S6212503B2 JP 6429680 A JP6429680 A JP 6429680A JP 6429680 A JP6429680 A JP 6429680A JP S6212503 B2 JPS6212503 B2 JP S6212503B2
Authority
JP
Japan
Prior art keywords
mask
etching
electron beam
resist
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6429680A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56158334A (en
Inventor
Yaichiro Watakabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6429680A priority Critical patent/JPS56158334A/ja
Publication of JPS56158334A publication Critical patent/JPS56158334A/ja
Publication of JPS6212503B2 publication Critical patent/JPS6212503B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Electron Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP6429680A 1980-05-12 1980-05-12 Manufacture of hard mask Granted JPS56158334A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6429680A JPS56158334A (en) 1980-05-12 1980-05-12 Manufacture of hard mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6429680A JPS56158334A (en) 1980-05-12 1980-05-12 Manufacture of hard mask

Publications (2)

Publication Number Publication Date
JPS56158334A JPS56158334A (en) 1981-12-07
JPS6212503B2 true JPS6212503B2 (enrdf_load_html_response) 1987-03-19

Family

ID=13254131

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6429680A Granted JPS56158334A (en) 1980-05-12 1980-05-12 Manufacture of hard mask

Country Status (1)

Country Link
JP (1) JPS56158334A (enrdf_load_html_response)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100422822B1 (ko) * 1996-10-05 2004-06-16 주식회사 하이닉스반도체 건식식각을이용한마스크의제조방법
TW480367B (en) * 2000-02-16 2002-03-21 Shinetsu Chemical Co Photomask blank, photomask and method of manufacture

Also Published As

Publication number Publication date
JPS56158334A (en) 1981-12-07

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