JPS6212502B2 - - Google Patents

Info

Publication number
JPS6212502B2
JPS6212502B2 JP3593680A JP3593680A JPS6212502B2 JP S6212502 B2 JPS6212502 B2 JP S6212502B2 JP 3593680 A JP3593680 A JP 3593680A JP 3593680 A JP3593680 A JP 3593680A JP S6212502 B2 JPS6212502 B2 JP S6212502B2
Authority
JP
Japan
Prior art keywords
thin film
mask
resist
ion etching
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3593680A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56130751A (en
Inventor
Yaichiro Watakabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP3593680A priority Critical patent/JPS56130751A/ja
Publication of JPS56130751A publication Critical patent/JPS56130751A/ja
Publication of JPS6212502B2 publication Critical patent/JPS6212502B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
JP3593680A 1980-03-18 1980-03-18 Manufacture of mask Granted JPS56130751A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3593680A JPS56130751A (en) 1980-03-18 1980-03-18 Manufacture of mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3593680A JPS56130751A (en) 1980-03-18 1980-03-18 Manufacture of mask

Publications (2)

Publication Number Publication Date
JPS56130751A JPS56130751A (en) 1981-10-13
JPS6212502B2 true JPS6212502B2 (enrdf_load_html_response) 1987-03-19

Family

ID=12455897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3593680A Granted JPS56130751A (en) 1980-03-18 1980-03-18 Manufacture of mask

Country Status (1)

Country Link
JP (1) JPS56130751A (enrdf_load_html_response)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6196765A (ja) * 1984-10-17 1986-05-15 Toshiba Corp 金属パタ−ン形成方法
GB2189903A (en) * 1986-04-01 1987-11-04 Plessey Co Plc An etch technique for metal mask definition

Also Published As

Publication number Publication date
JPS56130751A (en) 1981-10-13

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