JPS62121445A - 感光性組成物 - Google Patents
感光性組成物Info
- Publication number
- JPS62121445A JPS62121445A JP26313685A JP26313685A JPS62121445A JP S62121445 A JPS62121445 A JP S62121445A JP 26313685 A JP26313685 A JP 26313685A JP 26313685 A JP26313685 A JP 26313685A JP S62121445 A JPS62121445 A JP S62121445A
- Authority
- JP
- Japan
- Prior art keywords
- polyether
- polyvinyl alcohol
- polymer
- parts
- photosensitive composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26313685A JPS62121445A (ja) | 1985-11-21 | 1985-11-21 | 感光性組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26313685A JPS62121445A (ja) | 1985-11-21 | 1985-11-21 | 感光性組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62121445A true JPS62121445A (ja) | 1987-06-02 |
| JPH0511614B2 JPH0511614B2 (enExample) | 1993-02-16 |
Family
ID=17385311
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26313685A Granted JPS62121445A (ja) | 1985-11-21 | 1985-11-21 | 感光性組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62121445A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1993006529A1 (fr) * | 1991-09-14 | 1993-04-01 | San Nopco Limited | Composition resineuse photosensible |
| WO2003087939A3 (en) * | 2002-04-10 | 2004-03-04 | Kodak Polychrome Graphics Llc | On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments |
| JP2010032029A (ja) * | 2008-07-31 | 2010-02-12 | Hitachi Automotive Systems Ltd | シリンダ装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4272611A (en) * | 1978-10-26 | 1981-06-09 | Basf Aktiengesellschaft | Photopolymerizable composition for the production of printing plates and relief plates, and the elements produced therewith |
| EP0081964A2 (en) * | 1981-12-10 | 1983-06-22 | Toray Industries, Inc. | Photosensitive polymer composition |
| EP0130828A2 (en) * | 1983-07-01 | 1985-01-09 | Toray Industries, Inc. | Photosensitive resin composition |
| US4548894A (en) * | 1981-07-22 | 1985-10-22 | Basf Aktiengesellschaft | Photosensitive recording materials for the production of abrasion-resistant and scratch-resistant gravure printing plates comprising particles |
-
1985
- 1985-11-21 JP JP26313685A patent/JPS62121445A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4272611A (en) * | 1978-10-26 | 1981-06-09 | Basf Aktiengesellschaft | Photopolymerizable composition for the production of printing plates and relief plates, and the elements produced therewith |
| US4548894A (en) * | 1981-07-22 | 1985-10-22 | Basf Aktiengesellschaft | Photosensitive recording materials for the production of abrasion-resistant and scratch-resistant gravure printing plates comprising particles |
| EP0081964A2 (en) * | 1981-12-10 | 1983-06-22 | Toray Industries, Inc. | Photosensitive polymer composition |
| EP0130828A2 (en) * | 1983-07-01 | 1985-01-09 | Toray Industries, Inc. | Photosensitive resin composition |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1993006529A1 (fr) * | 1991-09-14 | 1993-04-01 | San Nopco Limited | Composition resineuse photosensible |
| US6899994B2 (en) | 2001-04-04 | 2005-05-31 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments |
| WO2003087939A3 (en) * | 2002-04-10 | 2004-03-04 | Kodak Polychrome Graphics Llc | On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments |
| JP2010032029A (ja) * | 2008-07-31 | 2010-02-12 | Hitachi Automotive Systems Ltd | シリンダ装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0511614B2 (enExample) | 1993-02-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |