JPS62116800A - めつき装置 - Google Patents
めつき装置Info
- Publication number
- JPS62116800A JPS62116800A JP25479985A JP25479985A JPS62116800A JP S62116800 A JPS62116800 A JP S62116800A JP 25479985 A JP25479985 A JP 25479985A JP 25479985 A JP25479985 A JP 25479985A JP S62116800 A JPS62116800 A JP S62116800A
- Authority
- JP
- Japan
- Prior art keywords
- anode
- plating
- wafers
- processed
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Wiring (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25479985A JPS62116800A (ja) | 1985-11-15 | 1985-11-15 | めつき装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25479985A JPS62116800A (ja) | 1985-11-15 | 1985-11-15 | めつき装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62116800A true JPS62116800A (ja) | 1987-05-28 |
JPH0568559B2 JPH0568559B2 (enrdf_load_stackoverflow) | 1993-09-29 |
Family
ID=17270052
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25479985A Granted JPS62116800A (ja) | 1985-11-15 | 1985-11-15 | めつき装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62116800A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2023157363A (ja) * | 2022-04-14 | 2023-10-26 | 株式会社日立パワーソリューションズ | めっき装置およびめっき方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55119199A (en) * | 1979-03-07 | 1980-09-12 | Ngk Insulators Ltd | Surface treatment apparatus for metal, etc. |
-
1985
- 1985-11-15 JP JP25479985A patent/JPS62116800A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55119199A (en) * | 1979-03-07 | 1980-09-12 | Ngk Insulators Ltd | Surface treatment apparatus for metal, etc. |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2023157363A (ja) * | 2022-04-14 | 2023-10-26 | 株式会社日立パワーソリューションズ | めっき装置およびめっき方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0568559B2 (enrdf_load_stackoverflow) | 1993-09-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2873954B2 (ja) | チップサイズ半導体パッケージの製造方法 | |
KR100329454B1 (ko) | 기판상에재료층을증착하는공정및도금시스템 | |
US6500325B2 (en) | Method of plating semiconductor wafer and plated semiconductor wafer | |
TW404156B (en) | Process for selective application of solder to circuit packages | |
US5871626A (en) | Flexible continuous cathode contact circuit for electrolytic plating of C4, TAB microbumps, and ultra large scale interconnects | |
JP3352352B2 (ja) | めっき装置、めっき方法およびバンプの形成方法 | |
US6201292B1 (en) | Resin-sealed semiconductor device, circuit member used therefor | |
JPS58182823A (ja) | 半導体ウエハ−のメツキ装置 | |
JPS62116800A (ja) | めつき装置 | |
JP3980809B2 (ja) | 電解処理装置 | |
JP2882416B2 (ja) | 電解めっきによる金属素子の形成方法 | |
JPH11163015A (ja) | メッキ装置 | |
JP3400278B2 (ja) | 半導体製造装置及び半導体装置の製造方法 | |
KR100865448B1 (ko) | 전기화학적 도금 장치 및 그 방법 | |
JPH02217429A (ja) | メッキ方法および装置 | |
JP4553632B2 (ja) | 基板めっき方法及び基板めっき装置 | |
JP3606795B2 (ja) | 噴流式バンプ形成装置 | |
JPH11181590A (ja) | 電解めっき方法および装置 | |
JPH07216585A (ja) | メッキ装置 | |
JPS636860A (ja) | フリップチップ用バンプ形成方法 | |
JPH087642Y2 (ja) | リードの半田メッキ装置 | |
JP3206131B2 (ja) | ウエハ用メッキ装置 | |
JPS6116431B2 (enrdf_load_stackoverflow) | ||
JPH06179998A (ja) | めっき装置 | |
JPH01198017A (ja) | ウエハの外部電極形成方法 |