JPS62103380A - Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 - Google Patents

Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Info

Publication number
JPS62103380A
JPS62103380A JP24366385A JP24366385A JPS62103380A JP S62103380 A JPS62103380 A JP S62103380A JP 24366385 A JP24366385 A JP 24366385A JP 24366385 A JP24366385 A JP 24366385A JP S62103380 A JPS62103380 A JP S62103380A
Authority
JP
Japan
Prior art keywords
vacuum chamber
ions
dry etching
corrosion resistance
cvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24366385A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0553872B2 (enExample
Inventor
Yutaka Kato
豊 加藤
Eizo Isoyama
礒山　永三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altemira Co Ltd
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP24366385A priority Critical patent/JPS62103380A/ja
Publication of JPS62103380A publication Critical patent/JPS62103380A/ja
Publication of JPH0553872B2 publication Critical patent/JPH0553872B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
JP24366385A 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 Granted JPS62103380A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24366385A JPS62103380A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24366385A JPS62103380A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Publications (2)

Publication Number Publication Date
JPS62103380A true JPS62103380A (ja) 1987-05-13
JPH0553872B2 JPH0553872B2 (enExample) 1993-08-11

Family

ID=17107150

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24366385A Granted JPS62103380A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Country Status (1)

Country Link
JP (1) JPS62103380A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6383964B1 (en) 1998-11-27 2002-05-07 Kyocera Corporation Ceramic member resistant to halogen-plasma corrosion
JP2007197835A (ja) * 2007-02-26 2007-08-09 Tocalo Co Ltd 耐ハロゲンガス性の半導体加工装置用部材

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4796464B2 (ja) 2005-11-17 2011-10-19 株式会社神戸製鋼所 耐食性に優れたアルミニウム合金部材

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021382A (ja) * 1983-07-15 1985-02-02 Canon Inc プラズマｃｖｄ装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021382A (ja) * 1983-07-15 1985-02-02 Canon Inc プラズマｃｖｄ装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6383964B1 (en) 1998-11-27 2002-05-07 Kyocera Corporation Ceramic member resistant to halogen-plasma corrosion
JP2007197835A (ja) * 2007-02-26 2007-08-09 Tocalo Co Ltd 耐ハロゲンガス性の半導体加工装置用部材

Also Published As

Publication number Publication date
JPH0553872B2 (enExample) 1993-08-11

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