JPS6210008B2 - - Google Patents
Info
- Publication number
- JPS6210008B2 JPS6210008B2 JP5681479A JP5681479A JPS6210008B2 JP S6210008 B2 JPS6210008 B2 JP S6210008B2 JP 5681479 A JP5681479 A JP 5681479A JP 5681479 A JP5681479 A JP 5681479A JP S6210008 B2 JPS6210008 B2 JP S6210008B2
- Authority
- JP
- Japan
- Prior art keywords
- mark
- electron beam
- position detection
- detection signal
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001514 detection method Methods 0.000 claims description 24
- 238000010894 electron beam technology Methods 0.000 claims description 20
- 238000005530 etching Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 229910000889 permalloy Inorganic materials 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5681479A JPS55148426A (en) | 1979-05-09 | 1979-05-09 | Electron beam position detecting method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5681479A JPS55148426A (en) | 1979-05-09 | 1979-05-09 | Electron beam position detecting method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55148426A JPS55148426A (en) | 1980-11-19 |
| JPS6210008B2 true JPS6210008B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-03-04 |
Family
ID=13037837
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5681479A Granted JPS55148426A (en) | 1979-05-09 | 1979-05-09 | Electron beam position detecting method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55148426A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
-
1979
- 1979-05-09 JP JP5681479A patent/JPS55148426A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55148426A (en) | 1980-11-19 |