JPS6197841U - - Google Patents

Info

Publication number
JPS6197841U
JPS6197841U JP18418884U JP18418884U JPS6197841U JP S6197841 U JPS6197841 U JP S6197841U JP 18418884 U JP18418884 U JP 18418884U JP 18418884 U JP18418884 U JP 18418884U JP S6197841 U JPS6197841 U JP S6197841U
Authority
JP
Japan
Prior art keywords
processing chamber
plate
mounting table
processed object
chuck ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18418884U
Other languages
Japanese (ja)
Other versions
JPH054282Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1984184188U priority Critical patent/JPH054282Y2/ja
Publication of JPS6197841U publication Critical patent/JPS6197841U/ja
Application granted granted Critical
Publication of JPH054282Y2 publication Critical patent/JPH054282Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Sheets, Magazines, And Separation Thereof (AREA)
  • Drying Of Semiconductors (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Registering Or Overturning Sheets (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案に係るチヤツキング装置を適用
したプラズマ処理装置の全体斜視図、第２図は処
理チヤンバーの縦断面図、第３図は載置台の斜視
図、第４図は載置台の拡大断面図、第５図乃至第
７図は本考案に係るチヤツキング装置の作用を説
明する断面図である。 尚、図面中１はプラズマ処理装置本体、２は処
理チヤンバー、７は真空引き装置、１０は上部電
極、１２は載置台、１５，１６，１７はロツド、
１９，２０，２１はシリンダユニツト、２２は蛇
腹部、２９は載置盤、Ｗは半導体ウエハーである
。 Fig. 1 is an overall perspective view of a plasma processing apparatus to which a chucking device according to the present invention is applied, Fig. 2 is a longitudinal sectional view of a processing chamber, Fig. 3 is a perspective view of a mounting table, and Fig. 4 is an enlarged view of the mounting table. 5 to 7 are cross-sectional views for explaining the operation of the chucking device according to the present invention. In the drawing, 1 is the main body of the plasma processing apparatus, 2 is the processing chamber, 7 is the evacuation device, 10 is the upper electrode, 12 is the mounting table, 15, 16, 17 are the rods,
19, 20, and 21 are cylinder units, 22 is a bellows portion, 29 is a mounting plate, and W is a semiconductor wafer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 真空引き装置が接続する処理チヤンバーと、こ
の処理チヤンバー内に設けられる板状被処理物の
載置台と、この載置台上面との間で板状被処理物
を保持するチヤツクリングと、前記処理チヤンバ
ー外に配置された昇降装置に基端部が結合し処理
チヤンバーを貫通して先端部が前記チヤツクリン
グに結着するロツドと、このロツドの処理チヤン
バーの貫通部に設けられ処理チヤンバー内外の連
通を遮断する蛇腹部とからなる板状被処理物のチ
ヤツキング装置。 A processing chamber to which a vacuum suction device is connected, a mounting table for a plate-shaped processed object provided inside the processing chamber, a chuck ring that holds the plate-shaped processed object between the top surface of this mounting table, and a chuck ring that holds the plate-shaped processed object between the top surface of this mounting table, and a rod whose proximal end is connected to an elevating device disposed in the processing chamber, passes through the processing chamber, and whose distal end is fixed to the chuck ring; and a rod provided at a penetrating portion of the processing chamber to block communication between the inside and outside of the processing chamber. A chucking device for a plate-shaped workpiece consisting of a bellows part.
JP1984184188U 1984-12-04 1984-12-04 Expired - Lifetime JPH054282Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1984184188U JPH054282Y2 (en) 1984-12-04 1984-12-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1984184188U JPH054282Y2 (en) 1984-12-04 1984-12-04

Publications (2)

Publication Number Publication Date
JPS6197841U true JPS6197841U (en) 1986-06-23
JPH054282Y2 JPH054282Y2 (en) 1993-02-02

Family

ID=30741673

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1984184188U Expired - Lifetime JPH054282Y2 (en) 1984-12-04 1984-12-04

Country Status (1)

Country Link
JP (1) JPH054282Y2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63283024A (en) * 1986-12-19 1988-11-18 アプライド　マテリアルズ　インコーポレーテッド Magnetic field accelerated plasma etching reactor
JPH01279783A (en) * 1988-05-02 1989-11-10 Tokyo Electron Ltd Etching device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5741064A (en) * 1980-08-25 1982-03-06 Nec Corp Digital board trunk
JPS58178533A (en) * 1982-04-14 1983-10-19 Hitachi Ltd Wafer push-up device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5741064A (en) * 1980-08-25 1982-03-06 Nec Corp Digital board trunk
JPS58178533A (en) * 1982-04-14 1983-10-19 Hitachi Ltd Wafer push-up device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63283024A (en) * 1986-12-19 1988-11-18 アプライド　マテリアルズ　インコーポレーテッド Magnetic field accelerated plasma etching reactor
JPH01279783A (en) * 1988-05-02 1989-11-10 Tokyo Electron Ltd Etching device

Also Published As

Publication number Publication date
JPH054282Y2 (en) 1993-02-02

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