JPH0322528U - - Google Patents
Info
- Publication number
- JPH0322528U JPH0322528U JP8415989U JP8415989U JPH0322528U JP H0322528 U JPH0322528 U JP H0322528U JP 8415989 U JP8415989 U JP 8415989U JP 8415989 U JP8415989 U JP 8415989U JP H0322528 U JPH0322528 U JP H0322528U
- Authority
- JP
- Japan
- Prior art keywords
- collection electrode
- vacuum chamber
- vacuum
- dust collection
- device equipped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000428 dust Substances 0.000 claims description 7
- 239000006096 absorbing agent Substances 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
Description
第１図は、本考案の実施例を説明する静電塵埃
吸着機付き真空装置の概略図、第２図は、従来の
ドライエツチング装置の概略図である。
１……ドライエツチング装置（真空装置）、２
……予備室（真空槽）、３……ゲートバルブ、４
……処理室（真空槽）、５……静電塵埃吸着器、
６……集塵用電極、７……高電圧発生器、８……
上部電極、９……下部電極、１０……高周波電源
、５０……被加工物。
FIG. 1 is a schematic diagram of a vacuum device with an electrostatic dust absorber for explaining an embodiment of the present invention, and FIG. 2 is a schematic diagram of a conventional dry etching device. 1...Dry etching device (vacuum device), 2
... Preliminary chamber (vacuum chamber), 3 ... Gate valve, 4
...Processing chamber (vacuum chamber), 5...Electrostatic dust absorber,
6... Dust collection electrode, 7... High voltage generator, 8...
Upper electrode, 9... Lower electrode, 10... High frequency power supply, 50... Workpiece.
Claims (1)
あつて、 前記真空槽内に設けた集塵用電極と、 この集塵用電極を接続した高電圧発生器とによ
つて構成した静電塵埃吸着器を設けたことを特徴
とする静電塵埃吸着器付き真空装置。[Scope of Claim for Utility Model Registration] A vacuum device equipped with a vacuum chamber equipped with an exhaust pump, comprising: a dust collection electrode provided in the vacuum chamber; and a high voltage generator connected to the dust collection electrode. A vacuum device equipped with an electrostatic dust absorber, characterized in that it is provided with an electrostatic dust absorber configured as above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8415989U JPH0322528U (en) | 1989-07-18 | 1989-07-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8415989U JPH0322528U (en) | 1989-07-18 | 1989-07-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0322528U true JPH0322528U (en) | 1991-03-08 |
Family
ID=31632412
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8415989U Pending JPH0322528U (en) | 1989-07-18 | 1989-07-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0322528U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08325733A (en) * | 1995-05-26 | 1996-12-10 | Tel Varian Ltd | Vacuum treatment and vacuum treating device |
| JP2002151495A (en) * | 2000-11-14 | 2002-05-24 | Sharp Corp | Plasma processing apparatus and semiconductor device manufactured thereby |
-
1989
- 1989-07-18 JP JP8415989U patent/JPH0322528U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08325733A (en) * | 1995-05-26 | 1996-12-10 | Tel Varian Ltd | Vacuum treatment and vacuum treating device |
| JP2002151495A (en) * | 2000-11-14 | 2002-05-24 | Sharp Corp | Plasma processing apparatus and semiconductor device manufactured thereby |