JPS6190161A - 集束イオンビ−ムのビ−ム形状調整方法 - Google Patents

集束イオンビ−ムのビ−ム形状調整方法

Info

Publication number
JPS6190161A
JPS6190161A JP59211675A JP21167584A JPS6190161A JP S6190161 A JPS6190161 A JP S6190161A JP 59211675 A JP59211675 A JP 59211675A JP 21167584 A JP21167584 A JP 21167584A JP S6190161 A JPS6190161 A JP S6190161A
Authority
JP
Japan
Prior art keywords
ion beam
ion
shape
pattern
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59211675A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6319856B2 (enrdf_load_stackoverflow
Inventor
Hideaki Kyogoku
京極　英明
Takashi Minafuji
孝 皆藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP59211675A priority Critical patent/JPS6190161A/ja
Priority to US06/783,247 priority patent/US4704526A/en
Priority to EP85307089A priority patent/EP0178129B1/en
Priority to DE8585307089T priority patent/DE3572889D1/de
Publication of JPS6190161A publication Critical patent/JPS6190161A/ja
Publication of JPS6319856B2 publication Critical patent/JPS6319856B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP59211675A 1984-10-09 1984-10-09 集束イオンビ−ムのビ−ム形状調整方法 Granted JPS6190161A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP59211675A JPS6190161A (ja) 1984-10-09 1984-10-09 集束イオンビ−ムのビ−ム形状調整方法
US06/783,247 US4704526A (en) 1984-10-09 1985-10-02 Apparatus of regulating shape of focused ion beams
EP85307089A EP0178129B1 (en) 1984-10-09 1985-10-03 Apparatus for and method of regulating the shape of a focused ion beam
DE8585307089T DE3572889D1 (en) 1984-10-09 1985-10-03 Apparatus for and method of regulating the shape of a focused ion beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59211675A JPS6190161A (ja) 1984-10-09 1984-10-09 集束イオンビ−ムのビ−ム形状調整方法

Publications (2)

Publication Number Publication Date
JPS6190161A true JPS6190161A (ja) 1986-05-08
JPS6319856B2 JPS6319856B2 (enrdf_load_stackoverflow) 1988-04-25

Family

ID=16609728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59211675A Granted JPS6190161A (ja) 1984-10-09 1984-10-09 集束イオンビ−ムのビ−ム形状調整方法

Country Status (4)

Country Link
US (1) US4704526A (enrdf_load_stackoverflow)
EP (1) EP0178129B1 (enrdf_load_stackoverflow)
JP (1) JPS6190161A (enrdf_load_stackoverflow)
DE (1) DE3572889D1 (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63138559U (enrdf_load_stackoverflow) * 1987-03-03 1988-09-12
JPH05251039A (ja) * 1992-03-04 1993-09-28 Ebara Corp 二次イオン質量分析計
FR2823005B1 (fr) * 2001-03-28 2003-05-16 Centre Nat Rech Scient Dispositif de generation d'un faisceau d'ions et procede de reglage de ce faisceau

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3628014A (en) * 1969-12-22 1971-12-14 Boeing Co Scanning electron microscope with color display means
US3772520A (en) * 1972-03-21 1973-11-13 Us Air Force Method for the investigation of thin films on a semiconductor substrate in a scanning electron microscope
US4041311A (en) * 1976-07-12 1977-08-09 Iowa State University Research Foundation, Inc. Scanning electron microscope with color image display
JPS5481075A (en) * 1977-11-24 1979-06-28 Cho Lsi Gijutsu Kenkyu Kumiai Method of detecting article image using electron beam
WO1983000921A1 (en) * 1981-09-01 1983-03-17 Antonovsky, Ariel, David Method and apparatus for image formation
JPS5856332A (ja) * 1981-09-30 1983-04-04 Hitachi Ltd マスクの欠陥修正方法
JPS5918555A (ja) * 1982-07-22 1984-01-30 Erionikusu:Kk 荷電粒子線取扱方法および装置
US4588890A (en) * 1984-12-31 1986-05-13 International Business Machines Corporation Apparatus and method for composite image formation by scanning electron beam

Also Published As

Publication number Publication date
DE3572889D1 (en) 1989-10-12
EP0178129B1 (en) 1989-09-06
JPS6319856B2 (enrdf_load_stackoverflow) 1988-04-25
US4704526A (en) 1987-11-03
EP0178129A2 (en) 1986-04-16
EP0178129A3 (en) 1988-01-20

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